PHOTOSETTING COMPOSITION

PURPOSE:To improve the photosensitivity of the resulting composition by adding an epoxy compound which is set by amine and an optically responding amine source. CONSTITUTION:The optically responding amine source is an amine Co (III) complex or an amine Co (III) complex. By adding a photoreducing age...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: UJIIE KOUJI, TANIGUCHI HAJIME
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator UJIIE KOUJI
TANIGUCHI HAJIME
description PURPOSE:To improve the photosensitivity of the resulting composition by adding an epoxy compound which is set by amine and an optically responding amine source. CONSTITUTION:The optically responding amine source is an amine Co (III) complex or an amine Co (III) complex. By adding a photoreducing agent system and a chelating agent to the complex, the efficiency of the complex producing amines including NH3 can be enhanced when the complex is irradiated with light. Produced amines set an epoxy compound. The unirradiated part of the compound is in an unset state, and by removing the part with an org. solvent or the like, a negative image can be obtd. When the photoreducing agent system is not added, by irradiating the Co (III) complex with ultraviolet rays, the complex is reduced to produce amines, and the amines set the epoxy compound.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPS5758142A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPS5758142A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPS5758142A3</originalsourceid><addsrcrecordid>eNrjZJAI8PAP8Q92DQnx9HNXcPb3DfAP9gzx9PfjYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxXgHBpuamFoYmRo7GRCgBAOopIBE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTOSETTING COMPOSITION</title><source>esp@cenet</source><creator>UJIIE KOUJI ; TANIGUCHI HAJIME</creator><creatorcontrib>UJIIE KOUJI ; TANIGUCHI HAJIME</creatorcontrib><description>PURPOSE:To improve the photosensitivity of the resulting composition by adding an epoxy compound which is set by amine and an optically responding amine source. CONSTITUTION:The optically responding amine source is an amine Co (III) complex or an amine Co (III) complex. By adding a photoreducing agent system and a chelating agent to the complex, the efficiency of the complex producing amines including NH3 can be enhanced when the complex is irradiated with light. Produced amines set an epoxy compound. The unirradiated part of the compound is in an unset state, and by removing the part with an org. solvent or the like, a negative image can be obtd. When the photoreducing agent system is not added, by irradiating the Co (III) complex with ultraviolet rays, the complex is reduced to produce amines, and the amines set the epoxy compound.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; AUXILIARY PROCESSES IN PHOTOGRAPHY ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>1982</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19820407&amp;DB=EPODOC&amp;CC=JP&amp;NR=S5758142A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19820407&amp;DB=EPODOC&amp;CC=JP&amp;NR=S5758142A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>UJIIE KOUJI</creatorcontrib><creatorcontrib>TANIGUCHI HAJIME</creatorcontrib><title>PHOTOSETTING COMPOSITION</title><description>PURPOSE:To improve the photosensitivity of the resulting composition by adding an epoxy compound which is set by amine and an optically responding amine source. CONSTITUTION:The optically responding amine source is an amine Co (III) complex or an amine Co (III) complex. By adding a photoreducing agent system and a chelating agent to the complex, the efficiency of the complex producing amines including NH3 can be enhanced when the complex is irradiated with light. Produced amines set an epoxy compound. The unirradiated part of the compound is in an unset state, and by removing the part with an org. solvent or the like, a negative image can be obtd. When the photoreducing agent system is not added, by irradiating the Co (III) complex with ultraviolet rays, the complex is reduced to produce amines, and the amines set the epoxy compound.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1982</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAI8PAP8Q92DQnx9HNXcPb3DfAP9gzx9PfjYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxXgHBpuamFoYmRo7GRCgBAOopIBE</recordid><startdate>19820407</startdate><enddate>19820407</enddate><creator>UJIIE KOUJI</creator><creator>TANIGUCHI HAJIME</creator><scope>EVB</scope></search><sort><creationdate>19820407</creationdate><title>PHOTOSETTING COMPOSITION</title><author>UJIIE KOUJI ; TANIGUCHI HAJIME</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS5758142A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1982</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>AUXILIARY PROCESSES IN PHOTOGRAPHY</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>UJIIE KOUJI</creatorcontrib><creatorcontrib>TANIGUCHI HAJIME</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>UJIIE KOUJI</au><au>TANIGUCHI HAJIME</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSETTING COMPOSITION</title><date>1982-04-07</date><risdate>1982</risdate><abstract>PURPOSE:To improve the photosensitivity of the resulting composition by adding an epoxy compound which is set by amine and an optically responding amine source. CONSTITUTION:The optically responding amine source is an amine Co (III) complex or an amine Co (III) complex. By adding a photoreducing agent system and a chelating agent to the complex, the efficiency of the complex producing amines including NH3 can be enhanced when the complex is irradiated with light. Produced amines set an epoxy compound. The unirradiated part of the compound is in an unset state, and by removing the part with an org. solvent or the like, a negative image can be obtd. When the photoreducing agent system is not added, by irradiating the Co (III) complex with ultraviolet rays, the complex is reduced to produce amines, and the amines set the epoxy compound.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JPS5758142A
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
AUXILIARY PROCESSES IN PHOTOGRAPHY
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
title PHOTOSETTING COMPOSITION
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T17%3A33%3A52IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=UJIIE%20KOUJI&rft.date=1982-04-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPS5758142A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true