THROTTLING MEANS FOR HOT DIPPING OF WIRE ROD
PURPOSE:To form a uniform tin hot dipped player at all times irrespectively of the passing speed of a wire rod such as a twisted wire through the inside of a plating metal throttling means of a specific shape by passing said wire rod taken up from a tin hot dipping bath through said throttling means...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | MERA YOSHIO |
description | PURPOSE:To form a uniform tin hot dipped player at all times irrespectively of the passing speed of a wire rod such as a twisted wire through the inside of a plating metal throttling means of a specific shape by passing said wire rod taken up from a tin hot dipping bath through said throttling means. CONSTITUTION:In the stage of passing a twisted conductor of copper or the like through the inside of a tin hot dipping bath, it is passed through a throttling means 10 in order to remove the excess molten tin stuck on the twisted wire and to form a uniform plating thickness. A through-hole 11 for passing of a plated twisted wire is provided along the central axial line 0 of the means 10 and the wire 1 stuck with excess molten tin 16 is taken up through the inside of the hole 11 to form a uniform tin plating layer. At this time, the diameter D of the hole 11 is set at D>=DO+2D/1,000 with respect to the outside diameter DO of the wire 1, the relation 20D>l>3D is provided between the same and the length l of the bearing part 13 of the means 10, and the approach angle 2alpha of an approach part 12 and an inlet diameter (d) are held in the relation 180 deg.>2alpha> 20 deg.8D>d>1.5D. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPS57185967A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPS57185967A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPS57185967A3</originalsourceid><addsrcrecordid>eNrjZNAJ8QjyDwnx8fRzV_B1dfQLVnDzD1Lw8A9RcPEMCACJ-rsphHsGuSoE-bvwMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JJ4r4BgU3NDC1NLM3NHY2LUAACZ8iV8</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>THROTTLING MEANS FOR HOT DIPPING OF WIRE ROD</title><source>esp@cenet</source><creator>MERA YOSHIO</creator><creatorcontrib>MERA YOSHIO</creatorcontrib><description>PURPOSE:To form a uniform tin hot dipped player at all times irrespectively of the passing speed of a wire rod such as a twisted wire through the inside of a plating metal throttling means of a specific shape by passing said wire rod taken up from a tin hot dipping bath through said throttling means. CONSTITUTION:In the stage of passing a twisted conductor of copper or the like through the inside of a tin hot dipping bath, it is passed through a throttling means 10 in order to remove the excess molten tin stuck on the twisted wire and to form a uniform plating thickness. A through-hole 11 for passing of a plated twisted wire is provided along the central axial line 0 of the means 10 and the wire 1 stuck with excess molten tin 16 is taken up through the inside of the hole 11 to form a uniform tin plating layer. At this time, the diameter D of the hole 11 is set at D>=DO+2D/1,000 with respect to the outside diameter DO of the wire 1, the relation 20D>l>3D is provided between the same and the length l of the bearing part 13 of the means 10, and the approach angle 2alpha of an approach part 12 and an inlet diameter (d) are held in the relation 180 deg.>2alpha> 20 deg.8D>d>1.5D.</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>1982</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19821116&DB=EPODOC&CC=JP&NR=S57185967A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25553,76306</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19821116&DB=EPODOC&CC=JP&NR=S57185967A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MERA YOSHIO</creatorcontrib><title>THROTTLING MEANS FOR HOT DIPPING OF WIRE ROD</title><description>PURPOSE:To form a uniform tin hot dipped player at all times irrespectively of the passing speed of a wire rod such as a twisted wire through the inside of a plating metal throttling means of a specific shape by passing said wire rod taken up from a tin hot dipping bath through said throttling means. CONSTITUTION:In the stage of passing a twisted conductor of copper or the like through the inside of a tin hot dipping bath, it is passed through a throttling means 10 in order to remove the excess molten tin stuck on the twisted wire and to form a uniform plating thickness. A through-hole 11 for passing of a plated twisted wire is provided along the central axial line 0 of the means 10 and the wire 1 stuck with excess molten tin 16 is taken up through the inside of the hole 11 to form a uniform tin plating layer. At this time, the diameter D of the hole 11 is set at D>=DO+2D/1,000 with respect to the outside diameter DO of the wire 1, the relation 20D>l>3D is provided between the same and the length l of the bearing part 13 of the means 10, and the approach angle 2alpha of an approach part 12 and an inlet diameter (d) are held in the relation 180 deg.>2alpha> 20 deg.8D>d>1.5D.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1982</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAJ8QjyDwnx8fRzV_B1dfQLVnDzD1Lw8A9RcPEMCACJ-rsphHsGuSoE-bvwMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JJ4r4BgU3NDC1NLM3NHY2LUAACZ8iV8</recordid><startdate>19821116</startdate><enddate>19821116</enddate><creator>MERA YOSHIO</creator><scope>EVB</scope></search><sort><creationdate>19821116</creationdate><title>THROTTLING MEANS FOR HOT DIPPING OF WIRE ROD</title><author>MERA YOSHIO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS57185967A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1982</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>MERA YOSHIO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MERA YOSHIO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>THROTTLING MEANS FOR HOT DIPPING OF WIRE ROD</title><date>1982-11-16</date><risdate>1982</risdate><abstract>PURPOSE:To form a uniform tin hot dipped player at all times irrespectively of the passing speed of a wire rod such as a twisted wire through the inside of a plating metal throttling means of a specific shape by passing said wire rod taken up from a tin hot dipping bath through said throttling means. CONSTITUTION:In the stage of passing a twisted conductor of copper or the like through the inside of a tin hot dipping bath, it is passed through a throttling means 10 in order to remove the excess molten tin stuck on the twisted wire and to form a uniform plating thickness. A through-hole 11 for passing of a plated twisted wire is provided along the central axial line 0 of the means 10 and the wire 1 stuck with excess molten tin 16 is taken up through the inside of the hole 11 to form a uniform tin plating layer. At this time, the diameter D of the hole 11 is set at D>=DO+2D/1,000 with respect to the outside diameter DO of the wire 1, the relation 20D>l>3D is provided between the same and the length l of the bearing part 13 of the means 10, and the approach angle 2alpha of an approach part 12 and an inlet diameter (d) are held in the relation 180 deg.>2alpha> 20 deg.8D>d>1.5D.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_JPS57185967A |
source | esp@cenet |
subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | THROTTLING MEANS FOR HOT DIPPING OF WIRE ROD |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T10%3A04%3A08IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MERA%20YOSHIO&rft.date=1982-11-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPS57185967A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |