DEVELOPING DEVICE FOR PHYSICAL LATENT IMAGE PATTERN
PURPOSE:To eliminate completely a redecomposition product by vaporization, by using electron shower irradiation and heating to redecompose polymer molecules in the development of a latent image pattern due to the decomposition of polymer molecules formed in a polymer thin film with irradiation of ra...
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creator | HATSUTORI SHIYUUZOU MORITA SHINZOU |
description | PURPOSE:To eliminate completely a redecomposition product by vaporization, by using electron shower irradiation and heating to redecompose polymer molecules in the development of a latent image pattern due to the decomposition of polymer molecules formed in a polymer thin film with irradiation of radiant rays. CONSTITUTION:A supporting table 3 by which a base material 2 provided with a polymer thin film 2a of the upper face is stored in an aritight vessel 1. The airtight vessel 1 is connected to a vacuum air discharging device through an air duct 4. An electron shower generating device 5 is provided above the airtight vessel 1. A heating device 11 is buried in the supporting table 3 and is energized electrically through a terminal 12 from the external. The base material 2 having a latent image pattern is set on the supporting table 3, and air in the vessel is discharged up to a vacuum proper to the generation of electron shower. Next, electron shower is generated, and the heating device is energized simultaneously with or continuously after this generation to heat the base material 2. A decomposition product is eliminated completely by vaporization but polymer molecules are not vaporized. |
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CONSTITUTION:A supporting table 3 by which a base material 2 provided with a polymer thin film 2a of the upper face is stored in an aritight vessel 1. The airtight vessel 1 is connected to a vacuum air discharging device through an air duct 4. An electron shower generating device 5 is provided above the airtight vessel 1. A heating device 11 is buried in the supporting table 3 and is energized electrically through a terminal 12 from the external. The base material 2 having a latent image pattern is set on the supporting table 3, and air in the vessel is discharged up to a vacuum proper to the generation of electron shower. Next, electron shower is generated, and the heating device is energized simultaneously with or continuously after this generation to heat the base material 2. A decomposition product is eliminated completely by vaporization but polymer molecules are not vaporized.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>1982</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19821110&DB=EPODOC&CC=JP&NR=S57182742A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19821110&DB=EPODOC&CC=JP&NR=S57182742A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HATSUTORI SHIYUUZOU</creatorcontrib><creatorcontrib>MORITA SHINZOU</creatorcontrib><title>DEVELOPING DEVICE FOR PHYSICAL LATENT IMAGE PATTERN</title><description>PURPOSE:To eliminate completely a redecomposition product by vaporization, by using electron shower irradiation and heating to redecompose polymer molecules in the development of a latent image pattern due to the decomposition of polymer molecules formed in a polymer thin film with irradiation of radiant rays. CONSTITUTION:A supporting table 3 by which a base material 2 provided with a polymer thin film 2a of the upper face is stored in an aritight vessel 1. The airtight vessel 1 is connected to a vacuum air discharging device through an air duct 4. An electron shower generating device 5 is provided above the airtight vessel 1. A heating device 11 is buried in the supporting table 3 and is energized electrically through a terminal 12 from the external. The base material 2 having a latent image pattern is set on the supporting table 3, and air in the vessel is discharged up to a vacuum proper to the generation of electron shower. Next, electron shower is generated, and the heating device is energized simultaneously with or continuously after this generation to heat the base material 2. A decomposition product is eliminated completely by vaporization but polymer molecules are not vaporized.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1982</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB2cQ1z9fEP8PRzVwAyPZ1dFdz8gxQCPCKDPZ0dfRR8HENc_UIUPH0d3V0VAhxDQlyD_HgYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSbxXQLCpuaGFkbmJkaMxMWoAoiAnZA</recordid><startdate>19821110</startdate><enddate>19821110</enddate><creator>HATSUTORI SHIYUUZOU</creator><creator>MORITA SHINZOU</creator><scope>EVB</scope></search><sort><creationdate>19821110</creationdate><title>DEVELOPING DEVICE FOR PHYSICAL LATENT IMAGE PATTERN</title><author>HATSUTORI SHIYUUZOU ; MORITA SHINZOU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS57182742A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1982</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>HATSUTORI SHIYUUZOU</creatorcontrib><creatorcontrib>MORITA SHINZOU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HATSUTORI SHIYUUZOU</au><au>MORITA SHINZOU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DEVELOPING DEVICE FOR PHYSICAL LATENT IMAGE PATTERN</title><date>1982-11-10</date><risdate>1982</risdate><abstract>PURPOSE:To eliminate completely a redecomposition product by vaporization, by using electron shower irradiation and heating to redecompose polymer molecules in the development of a latent image pattern due to the decomposition of polymer molecules formed in a polymer thin film with irradiation of radiant rays. CONSTITUTION:A supporting table 3 by which a base material 2 provided with a polymer thin film 2a of the upper face is stored in an aritight vessel 1. The airtight vessel 1 is connected to a vacuum air discharging device through an air duct 4. An electron shower generating device 5 is provided above the airtight vessel 1. A heating device 11 is buried in the supporting table 3 and is energized electrically through a terminal 12 from the external. The base material 2 having a latent image pattern is set on the supporting table 3, and air in the vessel is discharged up to a vacuum proper to the generation of electron shower. Next, electron shower is generated, and the heating device is energized simultaneously with or continuously after this generation to heat the base material 2. A decomposition product is eliminated completely by vaporization but polymer molecules are not vaporized.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | DEVELOPING DEVICE FOR PHYSICAL LATENT IMAGE PATTERN |
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