MASK STORAGE DEVICE
PROBLEM TO BE SOLVED: To decompose and remove defect causing materials sticking to a mask and to always ensure clean mask quality as well as to prevent the occurrence of defects on the mask during storage. SOLUTION: A wall 2 made of a photocatalytic material and an illumination light source 3 capabl...
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| creator | OKADA IKUO MATSUDA KOREHITO SEKIMOTO MISAO |
| description | PROBLEM TO BE SOLVED: To decompose and remove defect causing materials sticking to a mask and to always ensure clean mask quality as well as to prevent the occurrence of defects on the mask during storage. SOLUTION: A wall 2 made of a photocatalytic material and an illumination light source 3 capable of exciting photocatalytic reaction are disposed in a housing vessel 1 for housing a mask 4. When the wall 2 is irradiated with UV from the light source 3, excited active oxygen radicals etc., are generated from the surface of the wall 2 and photocatalytic reaction accompanied by strong oxidation-reduction action is caused. By the reaction, gaseous impurities etc., existing in atmospheric gas 5, are converted into harmless inorg. ions after decomposition, e.g. into gaseous CO2 and H2 . Defect causing materials do not stick to the mask 4 and the occurrence of defects on the mask 4 can be prevented. |
| format | Patent |
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SOLUTION: A wall 2 made of a photocatalytic material and an illumination light source 3 capable of exciting photocatalytic reaction are disposed in a housing vessel 1 for housing a mask 4. When the wall 2 is irradiated with UV from the light source 3, excited active oxygen radicals etc., are generated from the surface of the wall 2 and photocatalytic reaction accompanied by strong oxidation-reduction action is caused. By the reaction, gaseous impurities etc., existing in atmospheric gas 5, are converted into harmless inorg. ions after decomposition, e.g. into gaseous CO2 and H2 . 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SOLUTION: A wall 2 made of a photocatalytic material and an illumination light source 3 capable of exciting photocatalytic reaction are disposed in a housing vessel 1 for housing a mask 4. When the wall 2 is irradiated with UV from the light source 3, excited active oxygen radicals etc., are generated from the surface of the wall 2 and photocatalytic reaction accompanied by strong oxidation-reduction action is caused. By the reaction, gaseous impurities etc., existing in atmospheric gas 5, are converted into harmless inorg. ions after decomposition, e.g. into gaseous CO2 and H2 . Defect causing materials do not stick to the mask 4 and the occurrence of defects on the mask 4 can be prevented.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | MASK STORAGE DEVICE |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T05%3A38%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=OKADA%20IKUO&rft.date=1999-04-09&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPH1195413A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |