METHOD AND DEVICE FOR CONTROLLING SURFACE CONDITION OF CERAMIC SUBSTRATE

PROBLEM TO BE SOLVED: To provide a method and device for controlling the surface condition of a ceramic body in a process chamber, which is provided with a vacuum pump, an anode and a cathode. SOLUTION: A vacuum is produced in a process chamber 100 by a vacuum pump. Gas is introduced in the chamber....

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Bibliographische Detailangaben
Hauptverfasser:	BURKHART VINCE, TZOU EUGENE, PARKHE VIJAY, KHURANA NITIN, SANSONI STEVE
Format:	Patent
Sprache:	eng
Schlagworte:	ARTIFICIAL STONE BASIC ELECTRIC ELEMENTS CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE REFRACTORIES SEMICONDUCTOR DEVICES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method and device for controlling the surface condition of a ceramic body in a process chamber, which is provided with a vacuum pump, an anode and a cathode. SOLUTION: A vacuum is produced in a process chamber 100 by a vacuum pump. Gas is introduced in the chamber. An anode and a cathode are charged by a RF electric power 124. The gas is ignited and becomes plasma. The surface of a ceramic body is subjected to sputter etching with ion from plasma for removing contaminants. This method is adopted for controlling the surface condition so that a ceramic chuck may be in an initial condition in the process chamber 100 or for controlling the shape of the ceramic body or elements in a special chamber cleaning.