AL ALLOY MATERIAL FOR TRANSPORTING MACHINE EXCELLENT IN WATER RESISTANCE AND FILIFORM ERROSION RESISTANCE
PROBLEM TO BE SOLVED: To improve both filiform errosion resistance and water resistance of an Al alloy material by forming Al hydrated oxide film coposed of a planar upper layer film and a granular lower layer film having a specified thickness on the surface of an Al alloy material and providing the...
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| creator | SATO FUMIHIRO TOYOSE KIKURO |
| description | PROBLEM TO BE SOLVED: To improve both filiform errosion resistance and water resistance of an Al alloy material by forming Al hydrated oxide film coposed of a planar upper layer film and a granular lower layer film having a specified thickness on the surface of an Al alloy material and providing the surface with a coating film other than cation electrodeposition cating film. SOLUTION: The surface of an Al alloy material 1 is provided with an Al hydrated oxide film 2 and a coating film 5 accompanied by no electrochemical reaction. The Al hydrated oxide film 2 is composed of a planar relatively coarse upper layer film 3 and a a granular relatively dense lower layer film 4. The film thickness of the lower layer film is controlled to 50 to 3000 . The coating film 5 is formed by the coating film accompanied by no electrochemical reaction such as spray coating of a middle coat 6 and a finish coat 7. The Al hydrated oxide film is expressed by Al2 O3 .XH2 O, and the upper layer film 3 is the the one of >=2 X enough in hydration, in which the crystals of the planar Al hydrated oxides 9 are alternately piled up. The lower layer film 4 is the one of about 1 X, in which granular Al hydrated oxides 10 are crowded. |
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SOLUTION: The surface of an Al alloy material 1 is provided with an Al hydrated oxide film 2 and a coating film 5 accompanied by no electrochemical reaction. The Al hydrated oxide film 2 is composed of a planar relatively coarse upper layer film 3 and a a granular relatively dense lower layer film 4. The film thickness of the lower layer film is controlled to 50 to 3000 . The coating film 5 is formed by the coating film accompanied by no electrochemical reaction such as spray coating of a middle coat 6 and a finish coat 7. The Al hydrated oxide film is expressed by Al2 O3 .XH2 O, and the upper layer film 3 is the the one of >=2 X enough in hydration, in which the crystals of the planar Al hydrated oxides 9 are alternately piled up. The lower layer film 4 is the one of about 1 X, in which granular Al hydrated oxides 10 are crowded.</description><edition>6</edition><language>eng</language><subject>APPARATUS THEREFOR ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PERFORMING OPERATIONS ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS ; SPRAYING OR ATOMISING IN GENERAL ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19991126&DB=EPODOC&CC=JP&NR=H11323572A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19991126&DB=EPODOC&CC=JP&NR=H11323572A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SATO FUMIHIRO</creatorcontrib><creatorcontrib>TOYOSE KIKURO</creatorcontrib><title>AL ALLOY MATERIAL FOR TRANSPORTING MACHINE EXCELLENT IN WATER RESISTANCE AND FILIFORM ERROSION RESISTANCE</title><description>PROBLEM TO BE SOLVED: To improve both filiform errosion resistance and water resistance of an Al alloy material by forming Al hydrated oxide film coposed of a planar upper layer film and a granular lower layer film having a specified thickness on the surface of an Al alloy material and providing the surface with a coating film other than cation electrodeposition cating film. SOLUTION: The surface of an Al alloy material 1 is provided with an Al hydrated oxide film 2 and a coating film 5 accompanied by no electrochemical reaction. The Al hydrated oxide film 2 is composed of a planar relatively coarse upper layer film 3 and a a granular relatively dense lower layer film 4. The film thickness of the lower layer film is controlled to 50 to 3000 . The coating film 5 is formed by the coating film accompanied by no electrochemical reaction such as spray coating of a middle coat 6 and a finish coat 7. The Al hydrated oxide film is expressed by Al2 O3 .XH2 O, and the upper layer film 3 is the the one of >=2 X enough in hydration, in which the crystals of the planar Al hydrated oxides 9 are alternately piled up. The lower layer film 4 is the one of about 1 X, in which granular Al hydrated oxides 10 are crowded.</description><subject>APPARATUS THEREFOR</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1999</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNy7EKwkAQBNA0FqL-w_oBFkkQ6-XceCuXvbB3EK1CkBME0UD8f4xgYWk1DPNmnt3QATrnz1BjJOWpVl4hKkpovEaWw7QYy0JAJ0POkURggfbDQSlwiCiGAGUPFTue7jWQqg_s5Qcss9m1v49p9c1Ftq4oGrtJw7NL49Bf0iO9umNj87wsyu2uwPIf8wZr7TZC</recordid><startdate>19991126</startdate><enddate>19991126</enddate><creator>SATO FUMIHIRO</creator><creator>TOYOSE KIKURO</creator><scope>EVB</scope></search><sort><creationdate>19991126</creationdate><title>AL ALLOY MATERIAL FOR TRANSPORTING MACHINE EXCELLENT IN WATER RESISTANCE AND FILIFORM ERROSION RESISTANCE</title><author>SATO FUMIHIRO ; TOYOSE KIKURO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH11323572A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1999</creationdate><topic>APPARATUS THEREFOR</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SATO FUMIHIRO</creatorcontrib><creatorcontrib>TOYOSE KIKURO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SATO FUMIHIRO</au><au>TOYOSE KIKURO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>AL ALLOY MATERIAL FOR TRANSPORTING MACHINE EXCELLENT IN WATER RESISTANCE AND FILIFORM ERROSION RESISTANCE</title><date>1999-11-26</date><risdate>1999</risdate><abstract>PROBLEM TO BE SOLVED: To improve both filiform errosion resistance and water resistance of an Al alloy material by forming Al hydrated oxide film coposed of a planar upper layer film and a granular lower layer film having a specified thickness on the surface of an Al alloy material and providing the surface with a coating film other than cation electrodeposition cating film. SOLUTION: The surface of an Al alloy material 1 is provided with an Al hydrated oxide film 2 and a coating film 5 accompanied by no electrochemical reaction. The Al hydrated oxide film 2 is composed of a planar relatively coarse upper layer film 3 and a a granular relatively dense lower layer film 4. The film thickness of the lower layer film is controlled to 50 to 3000 . The coating film 5 is formed by the coating film accompanied by no electrochemical reaction such as spray coating of a middle coat 6 and a finish coat 7. The Al hydrated oxide film is expressed by Al2 O3 .XH2 O, and the upper layer film 3 is the the one of >=2 X enough in hydration, in which the crystals of the planar Al hydrated oxides 9 are alternately piled up. The lower layer film 4 is the one of about 1 X, in which granular Al hydrated oxides 10 are crowded.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING |
| title | AL ALLOY MATERIAL FOR TRANSPORTING MACHINE EXCELLENT IN WATER RESISTANCE AND FILIFORM ERROSION RESISTANCE |
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