RADIATION-SENSITIVE COMPOSITION FOR COLOR FILTER
PROBLEM TO BE SOLVED: To provide an innovative radiation-sensitive composition for a color filter which can provide excellent developing property even in the case pigments are mixed in high concentration and excellent pixels with high adhesion strength to a substrate and a light shielding layer and...
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| creator | NEMOTO HIROAKI ITOU YUKIKO IIJIMA TAKAHIRO SAKURAI KOICHI |
| description | PROBLEM TO BE SOLVED: To provide an innovative radiation-sensitive composition for a color filter which can provide excellent developing property even in the case pigments are mixed in high concentration and excellent pixels with high adhesion strength to a substrate and a light shielding layer and causes no residue and surface contamination on non-radiated parts of the substrate and the light shielding layer at the time of development. SOLUTION: This radiation-sensitive composition for a color filter consists of (A) coloring agents, (B) an alkali-soluble resin containing copolymer of a monomer having a defined formula and another copolymerizable monomer, (C) a multi-functional monomer, and (D) a photo polymerization initiator. In the formula, R stands for hydrogen atom or methyl group; m for an integer from 1 to 10; and n for an integer from 1 to 4. |
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SOLUTION: This radiation-sensitive composition for a color filter consists of (A) coloring agents, (B) an alkali-soluble resin containing copolymer of a monomer having a defined formula and another copolymerizable monomer, (C) a multi-functional monomer, and (D) a photo polymerization initiator. In the formula, R stands for hydrogen atom or methyl group; m for an integer from 1 to 10; and n for an integer from 1 to 4.</description><edition>6</edition><language>eng</language><subject>ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; CINEMATOGRAPHY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; COMPOSITIONS BASED THEREON ; CORRECTING FLUIDS ; DYES ; ELECTROGRAPHY ; FILLING PASTES ; HOLOGRAPHY ; INKS ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990924&DB=EPODOC&CC=JP&NR=H11258415A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,782,887,25573,76557</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990924&DB=EPODOC&CC=JP&NR=H11258415A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NEMOTO HIROAKI</creatorcontrib><creatorcontrib>ITOU YUKIKO</creatorcontrib><creatorcontrib>IIJIMA TAKAHIRO</creatorcontrib><creatorcontrib>SAKURAI KOICHI</creatorcontrib><title>RADIATION-SENSITIVE COMPOSITION FOR COLOR FILTER</title><description>PROBLEM TO BE SOLVED: To provide an innovative radiation-sensitive composition for a color filter which can provide excellent developing property even in the case pigments are mixed in high concentration and excellent pixels with high adhesion strength to a substrate and a light shielding layer and causes no residue and surface contamination on non-radiated parts of the substrate and the light shielding layer at the time of development. SOLUTION: This radiation-sensitive composition for a color filter consists of (A) coloring agents, (B) an alkali-soluble resin containing copolymer of a monomer having a defined formula and another copolymerizable monomer, (C) a multi-functional monomer, and (D) a photo polymerization initiator. In the formula, R stands for hydrogen atom or methyl group; m for an integer from 1 to 10; and n for an integer from 1 to 4.</description><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>FILLING PASTES</subject><subject>HOLOGRAPHY</subject><subject>INKS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1999</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAIcnTxdAzx9PfTDXb1C_YM8QxzVXD29w3wB7H9_RTc_IOAfB8g6ebpE-IaxMPAmpaYU5zKC6W5GRTdXEOcPXRTC_LjU4sLEpNT81JL4r0CPAwNjUwtTAxNHY2JUQMAWtkm0Q</recordid><startdate>19990924</startdate><enddate>19990924</enddate><creator>NEMOTO HIROAKI</creator><creator>ITOU YUKIKO</creator><creator>IIJIMA TAKAHIRO</creator><creator>SAKURAI KOICHI</creator><scope>EVB</scope></search><sort><creationdate>19990924</creationdate><title>RADIATION-SENSITIVE COMPOSITION FOR COLOR FILTER</title><author>NEMOTO HIROAKI ; ITOU YUKIKO ; IIJIMA TAKAHIRO ; SAKURAI KOICHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH11258415A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1999</creationdate><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>FILLING PASTES</topic><topic>HOLOGRAPHY</topic><topic>INKS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>NEMOTO HIROAKI</creatorcontrib><creatorcontrib>ITOU YUKIKO</creatorcontrib><creatorcontrib>IIJIMA TAKAHIRO</creatorcontrib><creatorcontrib>SAKURAI KOICHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NEMOTO HIROAKI</au><au>ITOU YUKIKO</au><au>IIJIMA TAKAHIRO</au><au>SAKURAI KOICHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>RADIATION-SENSITIVE COMPOSITION FOR COLOR FILTER</title><date>1999-09-24</date><risdate>1999</risdate><abstract>PROBLEM TO BE SOLVED: To provide an innovative radiation-sensitive composition for a color filter which can provide excellent developing property even in the case pigments are mixed in high concentration and excellent pixels with high adhesion strength to a substrate and a light shielding layer and causes no residue and surface contamination on non-radiated parts of the substrate and the light shielding layer at the time of development. SOLUTION: This radiation-sensitive composition for a color filter consists of (A) coloring agents, (B) an alkali-soluble resin containing copolymer of a monomer having a defined formula and another copolymerizable monomer, (C) a multi-functional monomer, and (D) a photo polymerization initiator. In the formula, R stands for hydrogen atom or methyl group; m for an integer from 1 to 10; and n for an integer from 1 to 4.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON CORRECTING FLUIDS DYES ELECTROGRAPHY FILLING PASTES HOLOGRAPHY INKS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS |
| title | RADIATION-SENSITIVE COMPOSITION FOR COLOR FILTER |
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