RADIATION-SENSITIVE COMPOSITION FOR COLOR FILTER

PROBLEM TO BE SOLVED: To provide an innovative radiation-sensitive composition for a color filter which can provide excellent developing property even in the case pigments are mixed in high concentration and excellent pixels with high adhesion strength to a substrate and a light shielding layer and...

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Bibliographische Detailangaben
Hauptverfasser: NEMOTO HIROAKI, ITOU YUKIKO, IIJIMA TAKAHIRO, SAKURAI KOICHI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide an innovative radiation-sensitive composition for a color filter which can provide excellent developing property even in the case pigments are mixed in high concentration and excellent pixels with high adhesion strength to a substrate and a light shielding layer and causes no residue and surface contamination on non-radiated parts of the substrate and the light shielding layer at the time of development. SOLUTION: This radiation-sensitive composition for a color filter consists of (A) coloring agents, (B) an alkali-soluble resin containing copolymer of a monomer having a defined formula and another copolymerizable monomer, (C) a multi-functional monomer, and (D) a photo polymerization initiator. In the formula, R stands for hydrogen atom or methyl group; m for an integer from 1 to 10; and n for an integer from 1 to 4.