PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD
PROBLEM TO BE SOLVED: To obtain the photosensitive composition high in resolution and high enough in sensitivity by incorporating a photo-cross-linking agent of a water-soluble azide compound and a poly-N-vinyl-acetamide(p-NVA) photocross-linkable by this compound. SOLUTION: The photosensitive compo...
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | TOCHISAWA TETSUAKI WATANABE MASAHARU TAKOSHI HIROTAKA |
| description | PROBLEM TO BE SOLVED: To obtain the photosensitive composition high in resolution and high enough in sensitivity by incorporating a photo-cross-linking agent of a water-soluble azide compound and a poly-N-vinyl-acetamide(p-NVA) photocross-linkable by this compound. SOLUTION: The photosensitive composition contains the water-soluble azide compound and a poly-N-vinyl-acetamide (p-NVA) photocross-linkable by this compound, and it is preferred that this p-VNA has a molecular weight of 100,000-4,000,000 and a viscosity of 300-70,000 cP from the view point of sensitivity and film forming property and the like. The photosensitive composition can be prepared by dissolving or dispersing p-NVA and the water-soluble azide compound and, when needed, various kinds of additives in a solvent composed mainly of water, and water is generally used as the solvent and water-soluble solvent, such as methanol or ethanol, can be used in an amount of |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH1124241A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH1124241A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH1124241A3</originalsourceid><addsrcrecordid>eNrjZDAN8PAP8Q929Qv2DPEMc1Vw9vcN8Aex_f0UHP1cFAIcQ0Jcg_wU3PyDfD393BV8XUM8_F14GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakm8V4CHoaGRiZGJoaMxEUoA4Fgn1g</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD</title><source>esp@cenet</source><creator>TOCHISAWA TETSUAKI ; WATANABE MASAHARU ; TAKOSHI HIROTAKA</creator><creatorcontrib>TOCHISAWA TETSUAKI ; WATANABE MASAHARU ; TAKOSHI HIROTAKA</creatorcontrib><description>PROBLEM TO BE SOLVED: To obtain the photosensitive composition high in resolution and high enough in sensitivity by incorporating a photo-cross-linking agent of a water-soluble azide compound and a poly-N-vinyl-acetamide(p-NVA) photocross-linkable by this compound. SOLUTION: The photosensitive composition contains the water-soluble azide compound and a poly-N-vinyl-acetamide (p-NVA) photocross-linkable by this compound, and it is preferred that this p-VNA has a molecular weight of 100,000-4,000,000 and a viscosity of 300-70,000 cP from the view point of sensitivity and film forming property and the like. The photosensitive composition can be prepared by dissolving or dispersing p-NVA and the water-soluble azide compound and, when needed, various kinds of additives in a solvent composed mainly of water, and water is generally used as the solvent and water-soluble solvent, such as methanol or ethanol, can be used in an amount of <=50 weight%.</description><edition>6</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990129&DB=EPODOC&CC=JP&NR=H1124241A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990129&DB=EPODOC&CC=JP&NR=H1124241A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TOCHISAWA TETSUAKI</creatorcontrib><creatorcontrib>WATANABE MASAHARU</creatorcontrib><creatorcontrib>TAKOSHI HIROTAKA</creatorcontrib><title>PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD</title><description>PROBLEM TO BE SOLVED: To obtain the photosensitive composition high in resolution and high enough in sensitivity by incorporating a photo-cross-linking agent of a water-soluble azide compound and a poly-N-vinyl-acetamide(p-NVA) photocross-linkable by this compound. SOLUTION: The photosensitive composition contains the water-soluble azide compound and a poly-N-vinyl-acetamide (p-NVA) photocross-linkable by this compound, and it is preferred that this p-VNA has a molecular weight of 100,000-4,000,000 and a viscosity of 300-70,000 cP from the view point of sensitivity and film forming property and the like. The photosensitive composition can be prepared by dissolving or dispersing p-NVA and the water-soluble azide compound and, when needed, various kinds of additives in a solvent composed mainly of water, and water is generally used as the solvent and water-soluble solvent, such as methanol or ethanol, can be used in an amount of <=50 weight%.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1999</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAN8PAP8Q929Qv2DPEMc1Vw9vcN8Aex_f0UHP1cFAIcQ0Jcg_wU3PyDfD393BV8XUM8_F14GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakm8V4CHoaGRiZGJoaMxEUoA4Fgn1g</recordid><startdate>19990129</startdate><enddate>19990129</enddate><creator>TOCHISAWA TETSUAKI</creator><creator>WATANABE MASAHARU</creator><creator>TAKOSHI HIROTAKA</creator><scope>EVB</scope></search><sort><creationdate>19990129</creationdate><title>PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD</title><author>TOCHISAWA TETSUAKI ; WATANABE MASAHARU ; TAKOSHI HIROTAKA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH1124241A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1999</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>TOCHISAWA TETSUAKI</creatorcontrib><creatorcontrib>WATANABE MASAHARU</creatorcontrib><creatorcontrib>TAKOSHI HIROTAKA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TOCHISAWA TETSUAKI</au><au>WATANABE MASAHARU</au><au>TAKOSHI HIROTAKA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD</title><date>1999-01-29</date><risdate>1999</risdate><abstract>PROBLEM TO BE SOLVED: To obtain the photosensitive composition high in resolution and high enough in sensitivity by incorporating a photo-cross-linking agent of a water-soluble azide compound and a poly-N-vinyl-acetamide(p-NVA) photocross-linkable by this compound. SOLUTION: The photosensitive composition contains the water-soluble azide compound and a poly-N-vinyl-acetamide (p-NVA) photocross-linkable by this compound, and it is preferred that this p-VNA has a molecular weight of 100,000-4,000,000 and a viscosity of 300-70,000 cP from the view point of sensitivity and film forming property and the like. The photosensitive composition can be prepared by dissolving or dispersing p-NVA and the water-soluble azide compound and, when needed, various kinds of additives in a solvent composed mainly of water, and water is generally used as the solvent and water-soluble solvent, such as methanol or ethanol, can be used in an amount of <=50 weight%.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JPH1124241A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T03%3A28%3A41IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TOCHISAWA%20TETSUAKI&rft.date=1999-01-29&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPH1124241A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |