OPTICAL SYSTEM AND EXPOSURE DEVICE AND PRODUCTION OF SEMICONDUCTOR DEVICE
PROBLEM TO BE SOLVED: To provide an optical system which substantially prevents the occurrence of a rotationally asymmetrical aberration fluctuation even when the optical members in the optical system like a projection optical system are cooled by a force convection. SOLUTION: The optical system PL...
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creator | HASHIMOTO SUMIO |
description | PROBLEM TO BE SOLVED: To provide an optical system which substantially prevents the occurrence of a rotationally asymmetrical aberration fluctuation even when the optical members in the optical system like a projection optical system are cooled by a force convection. SOLUTION: The optical system PL including plural optical elements L and holders G respectively holding these plural optical elements L is so constituted that the holders G are provided with medium supply sections 10 for supplying cooling media M to at least one space S formed between the plural optical elements L and further that the system is provided with a control means 20 for changing the direction for supplying the cooling media M with time. If the system is constituted in such a manner, the direction for supplying the cooling media M to the optical elements L changes and, therefore, the optical elements L may be cooled by the cooling media flowing in these directions different with time. More particularly the optical elements L may be maintained at a relatively uniform temp. distribution even with the optical system using a laser of a far IR region liable to be absorbed by the optical elements L, by which the aberrations may be suppressed. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH11218931A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH11218931A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH11218931A3</originalsourceid><addsrcrecordid>eNrjZPD0DwjxdHb0UQiODA5x9VVw9HNRcI0I8A8ODXJVcHEN83R2BYsFBPm7hDqHePr7Kfi7KQS7-no6-_uBRPyDoMp4GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8V4CHoaGRoYWlsaGjMTFqAEnqLXM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>OPTICAL SYSTEM AND EXPOSURE DEVICE AND PRODUCTION OF SEMICONDUCTOR DEVICE</title><source>esp@cenet</source><creator>HASHIMOTO SUMIO</creator><creatorcontrib>HASHIMOTO SUMIO</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide an optical system which substantially prevents the occurrence of a rotationally asymmetrical aberration fluctuation even when the optical members in the optical system like a projection optical system are cooled by a force convection. SOLUTION: The optical system PL including plural optical elements L and holders G respectively holding these plural optical elements L is so constituted that the holders G are provided with medium supply sections 10 for supplying cooling media M to at least one space S formed between the plural optical elements L and further that the system is provided with a control means 20 for changing the direction for supplying the cooling media M with time. If the system is constituted in such a manner, the direction for supplying the cooling media M to the optical elements L changes and, therefore, the optical elements L may be cooled by the cooling media flowing in these directions different with time. More particularly the optical elements L may be maintained at a relatively uniform temp. distribution even with the optical system using a laser of a far IR region liable to be absorbed by the optical elements L, by which the aberrations may be suppressed.</description><edition>6</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990810&DB=EPODOC&CC=JP&NR=H11218931A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990810&DB=EPODOC&CC=JP&NR=H11218931A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HASHIMOTO SUMIO</creatorcontrib><title>OPTICAL SYSTEM AND EXPOSURE DEVICE AND PRODUCTION OF SEMICONDUCTOR DEVICE</title><description>PROBLEM TO BE SOLVED: To provide an optical system which substantially prevents the occurrence of a rotationally asymmetrical aberration fluctuation even when the optical members in the optical system like a projection optical system are cooled by a force convection. SOLUTION: The optical system PL including plural optical elements L and holders G respectively holding these plural optical elements L is so constituted that the holders G are provided with medium supply sections 10 for supplying cooling media M to at least one space S formed between the plural optical elements L and further that the system is provided with a control means 20 for changing the direction for supplying the cooling media M with time. If the system is constituted in such a manner, the direction for supplying the cooling media M to the optical elements L changes and, therefore, the optical elements L may be cooled by the cooling media flowing in these directions different with time. More particularly the optical elements L may be maintained at a relatively uniform temp. distribution even with the optical system using a laser of a far IR region liable to be absorbed by the optical elements L, by which the aberrations may be suppressed.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1999</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPD0DwjxdHb0UQiODA5x9VVw9HNRcI0I8A8ODXJVcHEN83R2BYsFBPm7hDqHePr7Kfi7KQS7-no6-_uBRPyDoMp4GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8V4CHoaGRoYWlsaGjMTFqAEnqLXM</recordid><startdate>19990810</startdate><enddate>19990810</enddate><creator>HASHIMOTO SUMIO</creator><scope>EVB</scope></search><sort><creationdate>19990810</creationdate><title>OPTICAL SYSTEM AND EXPOSURE DEVICE AND PRODUCTION OF SEMICONDUCTOR DEVICE</title><author>HASHIMOTO SUMIO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH11218931A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1999</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>HASHIMOTO SUMIO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HASHIMOTO SUMIO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>OPTICAL SYSTEM AND EXPOSURE DEVICE AND PRODUCTION OF SEMICONDUCTOR DEVICE</title><date>1999-08-10</date><risdate>1999</risdate><abstract>PROBLEM TO BE SOLVED: To provide an optical system which substantially prevents the occurrence of a rotationally asymmetrical aberration fluctuation even when the optical members in the optical system like a projection optical system are cooled by a force convection. SOLUTION: The optical system PL including plural optical elements L and holders G respectively holding these plural optical elements L is so constituted that the holders G are provided with medium supply sections 10 for supplying cooling media M to at least one space S formed between the plural optical elements L and further that the system is provided with a control means 20 for changing the direction for supplying the cooling media M with time. If the system is constituted in such a manner, the direction for supplying the cooling media M to the optical elements L changes and, therefore, the optical elements L may be cooled by the cooling media flowing in these directions different with time. More particularly the optical elements L may be maintained at a relatively uniform temp. distribution even with the optical system using a laser of a far IR region liable to be absorbed by the optical elements L, by which the aberrations may be suppressed.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
title | OPTICAL SYSTEM AND EXPOSURE DEVICE AND PRODUCTION OF SEMICONDUCTOR DEVICE |
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