CARBON MADE REACTION FURNACE AND PRODUCTION OF PYROLYTIC BORON NITRIDE FORMED BODY
PROBLEM TO BE SOLVED: To produce a pyrolytic boron nitride formed body free from contamination and to prolong the service life of a reaction furnace by coating at least a part of the surface of a reaction vessel and a heating heater, which constitute a carbon made reaction furnace for carrying out C...
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| creator | YANAGISAWA ISAO IWAI RYOJI NAKAJIMA RYOJI |
| description | PROBLEM TO BE SOLVED: To produce a pyrolytic boron nitride formed body free from contamination and to prolong the service life of a reaction furnace by coating at least a part of the surface of a reaction vessel and a heating heater, which constitute a carbon made reaction furnace for carrying out CVD method with a pyrolytic boron nitride film. SOLUTION: The reaction furnace 10 arranged in a water cooling chamber 17 is constituted so that the carbon made heating heater 12 and a carbon made core bar 21 at the center are provided in a carbon made reactor 11 provided with a heat insulating material 16 and if necessary, a partition heat insulating material 13 for uniformly heating is arranged between the heater 12 and the core bar 21. Boron halide and ammonia are introduced into the reactor 11 through a gas introducing pipe 14 and allowed to react with each other under a condition of about 2000 deg.C and 0.1-10 Torr to CVD-form the pyrolytic baron nitride formed body 20. In such a case, the pyrolytic boron nitride film having 10 μm to 6 mm film thickness is formed on a part of or the whole surface of the reactor 11 and/or the heater 12 by CVD method. |
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SOLUTION: The reaction furnace 10 arranged in a water cooling chamber 17 is constituted so that the carbon made heating heater 12 and a carbon made core bar 21 at the center are provided in a carbon made reactor 11 provided with a heat insulating material 16 and if necessary, a partition heat insulating material 13 for uniformly heating is arranged between the heater 12 and the core bar 21. Boron halide and ammonia are introduced into the reactor 11 through a gas introducing pipe 14 and allowed to react with each other under a condition of about 2000 deg.C and 0.1-10 Torr to CVD-form the pyrolytic baron nitride formed body 20. In such a case, the pyrolytic boron nitride film having 10 μm to 6 mm film thickness is formed on a part of or the whole surface of the reactor 11 and/or the heater 12 by CVD method.</description><edition>6</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990803&DB=EPODOC&CC=JP&NR=H11209875A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990803&DB=EPODOC&CC=JP&NR=H11209875A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YANAGISAWA ISAO</creatorcontrib><creatorcontrib>IWAI RYOJI</creatorcontrib><creatorcontrib>NAKAJIMA RYOJI</creatorcontrib><title>CARBON MADE REACTION FURNACE AND PRODUCTION OF PYROLYTIC BORON NITRIDE FORMED BODY</title><description>PROBLEM TO BE SOLVED: To produce a pyrolytic boron nitride formed body free from contamination and to prolong the service life of a reaction furnace by coating at least a part of the surface of a reaction vessel and a heating heater, which constitute a carbon made reaction furnace for carrying out CVD method with a pyrolytic boron nitride film. SOLUTION: The reaction furnace 10 arranged in a water cooling chamber 17 is constituted so that the carbon made heating heater 12 and a carbon made core bar 21 at the center are provided in a carbon made reactor 11 provided with a heat insulating material 16 and if necessary, a partition heat insulating material 13 for uniformly heating is arranged between the heater 12 and the core bar 21. Boron halide and ammonia are introduced into the reactor 11 through a gas introducing pipe 14 and allowed to react with each other under a condition of about 2000 deg.C and 0.1-10 Torr to CVD-form the pyrolytic baron nitride formed body 20. In such a case, the pyrolytic boron nitride film having 10 μm to 6 mm film thickness is formed on a part of or the whole surface of the reactor 11 and/or the heater 12 by CVD method.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1999</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAhydgxy8vdT8HV0cVUIcnV0DvEE8txCg_wcnV0VHP1cFAKC_F1CIcL-bgoBkUH-PpEhns4KTv5BQCE_z5AgT6BWN_8gX1cXoKBLJA8Da1piTnEqL5TmZlB0cw1x9tBNLciPTy0uSExOzUstifcK8DA0NDKwtDA3dTQmRg0AwfIvug</recordid><startdate>19990803</startdate><enddate>19990803</enddate><creator>YANAGISAWA ISAO</creator><creator>IWAI RYOJI</creator><creator>NAKAJIMA RYOJI</creator><scope>EVB</scope></search><sort><creationdate>19990803</creationdate><title>CARBON MADE REACTION FURNACE AND PRODUCTION OF PYROLYTIC BORON NITRIDE FORMED BODY</title><author>YANAGISAWA ISAO ; IWAI RYOJI ; NAKAJIMA RYOJI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH11209875A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1999</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>YANAGISAWA ISAO</creatorcontrib><creatorcontrib>IWAI RYOJI</creatorcontrib><creatorcontrib>NAKAJIMA RYOJI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YANAGISAWA ISAO</au><au>IWAI RYOJI</au><au>NAKAJIMA RYOJI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CARBON MADE REACTION FURNACE AND PRODUCTION OF PYROLYTIC BORON NITRIDE FORMED BODY</title><date>1999-08-03</date><risdate>1999</risdate><abstract>PROBLEM TO BE SOLVED: To produce a pyrolytic boron nitride formed body free from contamination and to prolong the service life of a reaction furnace by coating at least a part of the surface of a reaction vessel and a heating heater, which constitute a carbon made reaction furnace for carrying out CVD method with a pyrolytic boron nitride film. SOLUTION: The reaction furnace 10 arranged in a water cooling chamber 17 is constituted so that the carbon made heating heater 12 and a carbon made core bar 21 at the center are provided in a carbon made reactor 11 provided with a heat insulating material 16 and if necessary, a partition heat insulating material 13 for uniformly heating is arranged between the heater 12 and the core bar 21. Boron halide and ammonia are introduced into the reactor 11 through a gas introducing pipe 14 and allowed to react with each other under a condition of about 2000 deg.C and 0.1-10 Torr to CVD-form the pyrolytic baron nitride formed body 20. In such a case, the pyrolytic boron nitride film having 10 μm to 6 mm film thickness is formed on a part of or the whole surface of the reactor 11 and/or the heater 12 by CVD method.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | CARBON MADE REACTION FURNACE AND PRODUCTION OF PYROLYTIC BORON NITRIDE FORMED BODY |
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