PHOTOSENSITIVE COMPOSITION

PROBLEM TO BE SOLVED: To provide the photosensitive composition developable in an aqueous developing solution and superior in storage stability and high in sensitivity and resolution. SOLUTION: This photosensitive composition contains an organic polymer compound, a polymerizable monomer, and a photo...

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Bibliographische Detailangaben
Hauptverfasser:	TOCHISAWA TETSUAKI, TAKANO KAZUHIRO, UTSUNOMIYA SHIN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide the photosensitive composition developable in an aqueous developing solution and superior in storage stability and high in sensitivity and resolution. SOLUTION: This photosensitive composition contains an organic polymer compound, a polymerizable monomer, and a photopolymerization initiator, and the above polymer compound is composed of N,N-disubstituted (meth) acryamide or N-monosubstituted (meth)acryamide but not of acid-functional group or its derivative and developable in an aqueous developing solution and at least one of water-soluble cellulose polymers, and as a polymerizable monomer, the water-soluble (meth)acrylic acid adduct of an epoxy compound is used as an essential component for the above polymer compound.