ELECTRIC DEVICE AND MANUFACTURE THEREOF

PROBLEM TO BE SOLVED: To enable a dielectric structure to be formed inside a non-planar capacitor and a ferroelectric memory cell by a method wherein a recess where a dielectric is deposited is demarcated by a gap between a plate electrode and a stacked electrode. SOLUTION: A capacitor structure 100 is composed of a first electrode or a plate electrode 1 and a second electrode or a stacked electrode 2 surrounded with the plate electrode 1. The plate electrode 1 is isolated from the stacked electrode 2 by a narrow gap filled with a capacitor dielectric body 3. A conductive plug 4 buried in a dielectric body 5 is brought into contact with a conductive region 6 on a board 20. A gap can be formed between the plate electrode 1 and the stacked electrode 2 in a final structure or between one or more sacrifice materials and either the plate electrode 1 or the stacked electrode 2. By this setup, the dielectric body 3 is not required to be deposited through a conformal process such as a chemical vapor deposition method.