LAMINATE
PROBLEM TO BE SOLVED: To improve the close adhesiveness between a base material and a sealing material by allowing a gas barrier layer formed in turn of a polymer molded item, silicon dioxide, silicon nitride, or a mixture of silicon dioxide and silicon nitride to be surface-treated by the agency of...
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creator | FUKUDA SHIN YAMAZAKI FUMIHARU GOTOU YUMI |
description | PROBLEM TO BE SOLVED: To improve the close adhesiveness between a base material and a sealing material by allowing a gas barrier layer formed in turn of a polymer molded item, silicon dioxide, silicon nitride, or a mixture of silicon dioxide and silicon nitride to be surface-treated by the agency of plasma containing metal. SOLUTION: A gas barrier layer 20 consisting of silicon oxide or silicon nitride, or a mixture of them is formed on at least one surface of a polymeric molded body 10. For such a method of the formation, a physical deposition method, a moisture method, a chemical vapour growth method and the like are employed. A surface treatment is carried out on the surface 21 of the gas barrier layer 20 by plasma containing metal. The superficial treatment containing metal referred to therein is achieved by permitting the gas barrier layer to be exposed on the metal-containing plasma. The metal containing plasma is obtained, e.g. by the steps of introducing discharging gas, generating plasma by DC glow discharge or RF glow discharge, and conducting evaporated particles of evaporated metal in the vacuum device by an electron beam or the like. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH1034790A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH1034790A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH1034790A3</originalsourceid><addsrcrecordid>eNrjZODwcfT19HMMceVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfFeAR6GBsYm5pYGjsZEKAEA8NQbCg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LAMINATE</title><source>esp@cenet</source><creator>FUKUDA SHIN ; YAMAZAKI FUMIHARU ; GOTOU YUMI</creator><creatorcontrib>FUKUDA SHIN ; YAMAZAKI FUMIHARU ; GOTOU YUMI</creatorcontrib><description>PROBLEM TO BE SOLVED: To improve the close adhesiveness between a base material and a sealing material by allowing a gas barrier layer formed in turn of a polymer molded item, silicon dioxide, silicon nitride, or a mixture of silicon dioxide and silicon nitride to be surface-treated by the agency of plasma containing metal. SOLUTION: A gas barrier layer 20 consisting of silicon oxide or silicon nitride, or a mixture of them is formed on at least one surface of a polymeric molded body 10. For such a method of the formation, a physical deposition method, a moisture method, a chemical vapour growth method and the like are employed. A surface treatment is carried out on the surface 21 of the gas barrier layer 20 by plasma containing metal. The superficial treatment containing metal referred to therein is achieved by permitting the gas barrier layer to be exposed on the metal-containing plasma. The metal containing plasma is obtained, e.g. by the steps of introducing discharging gas, generating plasma by DC glow discharge or RF glow discharge, and conducting evaporated particles of evaporated metal in the vacuum device by an electron beam or the like.</description><edition>6</edition><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; LAYERED PRODUCTS ; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM ; METALLURGY ; PERFORMING OPERATIONS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING</subject><creationdate>1998</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19980210&DB=EPODOC&CC=JP&NR=H1034790A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19980210&DB=EPODOC&CC=JP&NR=H1034790A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FUKUDA SHIN</creatorcontrib><creatorcontrib>YAMAZAKI FUMIHARU</creatorcontrib><creatorcontrib>GOTOU YUMI</creatorcontrib><title>LAMINATE</title><description>PROBLEM TO BE SOLVED: To improve the close adhesiveness between a base material and a sealing material by allowing a gas barrier layer formed in turn of a polymer molded item, silicon dioxide, silicon nitride, or a mixture of silicon dioxide and silicon nitride to be surface-treated by the agency of plasma containing metal. SOLUTION: A gas barrier layer 20 consisting of silicon oxide or silicon nitride, or a mixture of them is formed on at least one surface of a polymeric molded body 10. For such a method of the formation, a physical deposition method, a moisture method, a chemical vapour growth method and the like are employed. A surface treatment is carried out on the surface 21 of the gas barrier layer 20 by plasma containing metal. The superficial treatment containing metal referred to therein is achieved by permitting the gas barrier layer to be exposed on the metal-containing plasma. The metal containing plasma is obtained, e.g. by the steps of introducing discharging gas, generating plasma by DC glow discharge or RF glow discharge, and conducting evaporated particles of evaporated metal in the vacuum device by an electron beam or the like.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>LAYERED PRODUCTS</subject><subject>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1998</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZODwcfT19HMMceVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfFeAR6GBsYm5pYGjsZEKAEA8NQbCg</recordid><startdate>19980210</startdate><enddate>19980210</enddate><creator>FUKUDA SHIN</creator><creator>YAMAZAKI FUMIHARU</creator><creator>GOTOU YUMI</creator><scope>EVB</scope></search><sort><creationdate>19980210</creationdate><title>LAMINATE</title><author>FUKUDA SHIN ; YAMAZAKI FUMIHARU ; GOTOU YUMI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH1034790A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1998</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>LAYERED PRODUCTS</topic><topic>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>FUKUDA SHIN</creatorcontrib><creatorcontrib>YAMAZAKI FUMIHARU</creatorcontrib><creatorcontrib>GOTOU YUMI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FUKUDA SHIN</au><au>YAMAZAKI FUMIHARU</au><au>GOTOU YUMI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LAMINATE</title><date>1998-02-10</date><risdate>1998</risdate><abstract>PROBLEM TO BE SOLVED: To improve the close adhesiveness between a base material and a sealing material by allowing a gas barrier layer formed in turn of a polymer molded item, silicon dioxide, silicon nitride, or a mixture of silicon dioxide and silicon nitride to be surface-treated by the agency of plasma containing metal. SOLUTION: A gas barrier layer 20 consisting of silicon oxide or silicon nitride, or a mixture of them is formed on at least one surface of a polymeric molded body 10. For such a method of the formation, a physical deposition method, a moisture method, a chemical vapour growth method and the like are employed. A surface treatment is carried out on the surface 21 of the gas barrier layer 20 by plasma containing metal. The superficial treatment containing metal referred to therein is achieved by permitting the gas barrier layer to be exposed on the metal-containing plasma. The metal containing plasma is obtained, e.g. by the steps of introducing discharging gas, generating plasma by DC glow discharge or RF glow discharge, and conducting evaporated particles of evaporated metal in the vacuum device by an electron beam or the like.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY PERFORMING OPERATIONS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING |
title | LAMINATE |
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