PRODUCTION OF LOW CORE LOSS GRAIN ORIENTED SILICON STEEL SHEET

PROBLEM TO BE SOLVED: To stably obtain a grain oriented silicon steel sheet which is low in core loss by subjecting a slab for the grain oriented silicon steel sheet to hot rolling and cold rolling to a final thickness, then forming an etching mask, forming linear or dotted grooves by electrolytic e...

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Hauptverfasser: SATO KEIJI, TOFUJI TAKESHI, YASUFUKU MASAO, NAMURA NATSUKI, HINA EIJI
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creator SATO KEIJI
TOFUJI TAKESHI
YASUFUKU MASAO
NAMURA NATSUKI
HINA EIJI
description PROBLEM TO BE SOLVED: To stably obtain a grain oriented silicon steel sheet which is low in core loss by subjecting a slab for the grain oriented silicon steel sheet to hot rolling and cold rolling to a final thickness, then forming an etching mask, forming linear or dotted grooves by electrolytic etching and subjecting this slab to final finish annealing. SOLUTION: The slab for the grain oriented silicon steel sheet contg. 2 to 4% Si is hot rolled to a hot rolled sheet and this sheet is subjected to one time or >=2 times of cold rolling including intermediate annealing to the cold rolled sheet having the final thickness. Next, an etching resist is applied on the surface of the cold rolled sheet and is dried and backed to form the etching mask. The linear or dotted grooves are formed by the electrolytic etching on the steel sheet surface. Finally, the mask is removed and the steel sheet is subjected to decarburization annealing and final finish annealing, by which the low core loss grain oriented silicon steel sheet is produced. The application of the etching resist maintains the relation -0.25L+90>D>-25L+75 between a mesh size (L) (100 to 200 mesh/inch) and mesh depth D (30 to 60 μm).
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH10265851A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH10265851A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH10265851A3</originalsourceid><addsrcrecordid>eNrjZLALCPJ3CXUO8fT3U_B3U_DxD1dw9g9yBTKCgxXcgxw9gcJBnq5-Ia4uCsGePp7OQHXBIa6uPgrBHq6uITwMrGmJOcWpvFCam0HRzTXE2UM3tSA_PrW4IDE5NS-1JN4rwMPQwMjM1MLU0NGYGDUAXFsqSQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PRODUCTION OF LOW CORE LOSS GRAIN ORIENTED SILICON STEEL SHEET</title><source>esp@cenet</source><creator>SATO KEIJI ; TOFUJI TAKESHI ; YASUFUKU MASAO ; NAMURA NATSUKI ; HINA EIJI</creator><creatorcontrib>SATO KEIJI ; TOFUJI TAKESHI ; YASUFUKU MASAO ; NAMURA NATSUKI ; HINA EIJI</creatorcontrib><description>PROBLEM TO BE SOLVED: To stably obtain a grain oriented silicon steel sheet which is low in core loss by subjecting a slab for the grain oriented silicon steel sheet to hot rolling and cold rolling to a final thickness, then forming an etching mask, forming linear or dotted grooves by electrolytic etching and subjecting this slab to final finish annealing. SOLUTION: The slab for the grain oriented silicon steel sheet contg. 2 to 4% Si is hot rolled to a hot rolled sheet and this sheet is subjected to one time or &gt;=2 times of cold rolling including intermediate annealing to the cold rolled sheet having the final thickness. Next, an etching resist is applied on the surface of the cold rolled sheet and is dried and backed to form the etching mask. The linear or dotted grooves are formed by the electrolytic etching on the steel sheet surface. Finally, the mask is removed and the steel sheet is subjected to decarburization annealing and final finish annealing, by which the low core loss grain oriented silicon steel sheet is produced. The application of the etching resist maintains the relation -0.25L+90&gt;D&gt;-25L+75 between a mesh size (L) (100 to 200 mesh/inch) and mesh depth D (30 to 60 μm).</description><edition>6</edition><language>eng</language><subject>APPARATUS THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS ; ELECTRICITY ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUSMETALS OR ALLOYS ; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC ; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS ; INDUCTANCES ; MAGNETS ; MAKING METAL MALLEABLE BY DECARBURISATION, TEMPERING OR OTHERTREATMENTS ; METALLURGY ; METALLURGY OF IRON ; MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS ; PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS ; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES ; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS ; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE ; TRANSFORMERS</subject><creationdate>1998</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19981006&amp;DB=EPODOC&amp;CC=JP&amp;NR=H10265851A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19981006&amp;DB=EPODOC&amp;CC=JP&amp;NR=H10265851A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SATO KEIJI</creatorcontrib><creatorcontrib>TOFUJI TAKESHI</creatorcontrib><creatorcontrib>YASUFUKU MASAO</creatorcontrib><creatorcontrib>NAMURA NATSUKI</creatorcontrib><creatorcontrib>HINA EIJI</creatorcontrib><title>PRODUCTION OF LOW CORE LOSS GRAIN ORIENTED SILICON STEEL SHEET</title><description>PROBLEM TO BE SOLVED: To stably obtain a grain oriented silicon steel sheet which is low in core loss by subjecting a slab for the grain oriented silicon steel sheet to hot rolling and cold rolling to a final thickness, then forming an etching mask, forming linear or dotted grooves by electrolytic etching and subjecting this slab to final finish annealing. SOLUTION: The slab for the grain oriented silicon steel sheet contg. 2 to 4% Si is hot rolled to a hot rolled sheet and this sheet is subjected to one time or &gt;=2 times of cold rolling including intermediate annealing to the cold rolled sheet having the final thickness. Next, an etching resist is applied on the surface of the cold rolled sheet and is dried and backed to form the etching mask. The linear or dotted grooves are formed by the electrolytic etching on the steel sheet surface. Finally, the mask is removed and the steel sheet is subjected to decarburization annealing and final finish annealing, by which the low core loss grain oriented silicon steel sheet is produced. The application of the etching resist maintains the relation -0.25L+90&gt;D&gt;-25L+75 between a mesh size (L) (100 to 200 mesh/inch) and mesh depth D (30 to 60 μm).</description><subject>APPARATUS THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS</subject><subject>ELECTRICITY</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUSMETALS OR ALLOYS</subject><subject>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</subject><subject>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</subject><subject>INDUCTANCES</subject><subject>MAGNETS</subject><subject>MAKING METAL MALLEABLE BY DECARBURISATION, TEMPERING OR OTHERTREATMENTS</subject><subject>METALLURGY</subject><subject>METALLURGY OF IRON</subject><subject>MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS</subject><subject>PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS</subject><subject>SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</subject><subject>TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE</subject><subject>TRANSFORMERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1998</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLALCPJ3CXUO8fT3U_B3U_DxD1dw9g9yBTKCgxXcgxw9gcJBnq5-Ia4uCsGePp7OQHXBIa6uPgrBHq6uITwMrGmJOcWpvFCam0HRzTXE2UM3tSA_PrW4IDE5NS-1JN4rwMPQwMjM1MLU0NGYGDUAXFsqSQ</recordid><startdate>19981006</startdate><enddate>19981006</enddate><creator>SATO KEIJI</creator><creator>TOFUJI TAKESHI</creator><creator>YASUFUKU MASAO</creator><creator>NAMURA NATSUKI</creator><creator>HINA EIJI</creator><scope>EVB</scope></search><sort><creationdate>19981006</creationdate><title>PRODUCTION OF LOW CORE LOSS GRAIN ORIENTED SILICON STEEL SHEET</title><author>SATO KEIJI ; TOFUJI TAKESHI ; YASUFUKU MASAO ; NAMURA NATSUKI ; HINA EIJI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH10265851A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1998</creationdate><topic>APPARATUS THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS</topic><topic>ELECTRICITY</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUSMETALS OR ALLOYS</topic><topic>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</topic><topic>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</topic><topic>INDUCTANCES</topic><topic>MAGNETS</topic><topic>MAKING METAL MALLEABLE BY DECARBURISATION, TEMPERING OR OTHERTREATMENTS</topic><topic>METALLURGY</topic><topic>METALLURGY OF IRON</topic><topic>MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS</topic><topic>PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS</topic><topic>SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</topic><topic>TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE</topic><topic>TRANSFORMERS</topic><toplevel>online_resources</toplevel><creatorcontrib>SATO KEIJI</creatorcontrib><creatorcontrib>TOFUJI TAKESHI</creatorcontrib><creatorcontrib>YASUFUKU MASAO</creatorcontrib><creatorcontrib>NAMURA NATSUKI</creatorcontrib><creatorcontrib>HINA EIJI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SATO KEIJI</au><au>TOFUJI TAKESHI</au><au>YASUFUKU MASAO</au><au>NAMURA NATSUKI</au><au>HINA EIJI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PRODUCTION OF LOW CORE LOSS GRAIN ORIENTED SILICON STEEL SHEET</title><date>1998-10-06</date><risdate>1998</risdate><abstract>PROBLEM TO BE SOLVED: To stably obtain a grain oriented silicon steel sheet which is low in core loss by subjecting a slab for the grain oriented silicon steel sheet to hot rolling and cold rolling to a final thickness, then forming an etching mask, forming linear or dotted grooves by electrolytic etching and subjecting this slab to final finish annealing. SOLUTION: The slab for the grain oriented silicon steel sheet contg. 2 to 4% Si is hot rolled to a hot rolled sheet and this sheet is subjected to one time or &gt;=2 times of cold rolling including intermediate annealing to the cold rolled sheet having the final thickness. Next, an etching resist is applied on the surface of the cold rolled sheet and is dried and backed to form the etching mask. The linear or dotted grooves are formed by the electrolytic etching on the steel sheet surface. Finally, the mask is removed and the steel sheet is subjected to decarburization annealing and final finish annealing, by which the low core loss grain oriented silicon steel sheet is produced. The application of the etching resist maintains the relation -0.25L+90&gt;D&gt;-25L+75 between a mesh size (L) (100 to 200 mesh/inch) and mesh depth D (30 to 60 μm).</abstract><edition>6</edition><oa>free_for_read</oa></addata></record>
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source esp@cenet
subjects APPARATUS THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS
ELECTRICITY
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUSMETALS OR ALLOYS
GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS
INDUCTANCES
MAGNETS
MAKING METAL MALLEABLE BY DECARBURISATION, TEMPERING OR OTHERTREATMENTS
METALLURGY
METALLURGY OF IRON
MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS
PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS
SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE
TRANSFORMERS
title PRODUCTION OF LOW CORE LOSS GRAIN ORIENTED SILICON STEEL SHEET
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T14%3A29%3A59IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SATO%20KEIJI&rft.date=1998-10-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPH10265851A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true