CVD JIG, MANUFACTURE OF SEMICONDUCTOR DEVICE USING THE SAME, AND MANUFACTURE OF THE CVD JIG

PROBLEM TO BE SOLVED: To improve the resistance to cleaning chemicals while taking measures for the devitrification and cracks by specifying the OH concn. of the quartz surface near wafer supports of a CVD jig. SOLUTION: For manufacturing a CVD jig, the surface is melted using an arc plasma torch 14...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KOBAYASHI KAZUO, MIMURA SEIICHI, FUJII ATSUHIRO, HORIE YASUHIKO, ONISHI HIROSHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To improve the resistance to cleaning chemicals while taking measures for the devitrification and cracks by specifying the OH concn. of the quartz surface near wafer supports of a CVD jig. SOLUTION: For manufacturing a CVD jig, the surface is melted using an arc plasma torch 14 e.g. tungsten inert gas torch using a high-m.p. metal e.g. W for high temp. parts of the torch, esp. inner electrode. To avoid contaminating the plasma with a metal from the electrode, an ac electrode is used and covered with a ceramic against sputtering. A wafer support 2 surface is exposed to an atmosphere substd. with Ar gas produced from the arc plasma torch to avoid the action of H on quartz, thereby reducing the OH concn. in quartz to 30ppm or less on the quartz surface to improve the corrosion resistance.