FCC METAL IN WHICH CRYSTAL ORIENTATION IS REGULATED AND ITS PRODUCTION
PROBLEM TO BE SOLVED: To obtain an FCC metal in which crystal orientation is properly regulated and suitable for the material for a sputtering target by regulating the ratio of the integrated intensity of the (200) plane to that of the (111) plane in the crystals to specified value or above. SOLUTIO...
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| creator | TANABE IKU KANZAKI TOSHIHIRO |
| description | PROBLEM TO BE SOLVED: To obtain an FCC metal in which crystal orientation is properly regulated and suitable for the material for a sputtering target by regulating the ratio of the integrated intensity of the (200) plane to that of the (111) plane in the crystals to specified value or above. SOLUTION: It is desirable that the FCC metal has (110) priority orientation for securing directivity as for the crystal orientation. As the evaluatio therefor, heat treatment is executed so as to regulate the ratio of the integrated intensity of the (220) plane to that of the (111) plane in X-ray diffraction, i.e., I(220) /I(111) value to >=2.0, by which good FCC can be obtd. Furthermore, among FCC, particularly, the one having a Cu matrix is excellent in electromagnation. Since the purity of this Cu exerts a remarkable influence on the fine structure of the coating, the purity of the Cu matrix is preferably regulated to >=6N. Moreover, since the sputtering rate and the uniformity of the coating deteriorate in the case the average grain size is made coarser, it is regulated to |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH10195610A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH10195610A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH10195610A3</originalsourceid><addsrcrecordid>eNrjZHBzc3ZW8HUNcfRR8PRTCPfwdPZQcA6KDAYJ-Ad5uvqFOIZ4-vspeAYrBLm6h_o4hri6KDj6uSh4hgQrBAT5u4Q6g-R5GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8V4CHoYGhpamZoYGjMTFqAJhnLFc</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>FCC METAL IN WHICH CRYSTAL ORIENTATION IS REGULATED AND ITS PRODUCTION</title><source>esp@cenet</source><creator>TANABE IKU ; KANZAKI TOSHIHIRO</creator><creatorcontrib>TANABE IKU ; KANZAKI TOSHIHIRO</creatorcontrib><description>PROBLEM TO BE SOLVED: To obtain an FCC metal in which crystal orientation is properly regulated and suitable for the material for a sputtering target by regulating the ratio of the integrated intensity of the (200) plane to that of the (111) plane in the crystals to specified value or above. SOLUTION: It is desirable that the FCC metal has (110) priority orientation for securing directivity as for the crystal orientation. As the evaluatio therefor, heat treatment is executed so as to regulate the ratio of the integrated intensity of the (220) plane to that of the (111) plane in X-ray diffraction, i.e., I(220) /I(111) value to >=2.0, by which good FCC can be obtd. Furthermore, among FCC, particularly, the one having a Cu matrix is excellent in electromagnation. Since the purity of this Cu exerts a remarkable influence on the fine structure of the coating, the purity of the Cu matrix is preferably regulated to >=6N. Moreover, since the sputtering rate and the uniformity of the coating deteriorate in the case the average grain size is made coarser, it is regulated to <=200μm.</description><edition>6</edition><language>eng</language><subject>ALLOYS ; CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; FERROUS OR NON-FERROUS ALLOYS ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TREATMENT OF ALLOYS OR NON-FERROUS METALS</subject><creationdate>1998</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19980728&DB=EPODOC&CC=JP&NR=H10195610A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19980728&DB=EPODOC&CC=JP&NR=H10195610A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TANABE IKU</creatorcontrib><creatorcontrib>KANZAKI TOSHIHIRO</creatorcontrib><title>FCC METAL IN WHICH CRYSTAL ORIENTATION IS REGULATED AND ITS PRODUCTION</title><description>PROBLEM TO BE SOLVED: To obtain an FCC metal in which crystal orientation is properly regulated and suitable for the material for a sputtering target by regulating the ratio of the integrated intensity of the (200) plane to that of the (111) plane in the crystals to specified value or above. SOLUTION: It is desirable that the FCC metal has (110) priority orientation for securing directivity as for the crystal orientation. As the evaluatio therefor, heat treatment is executed so as to regulate the ratio of the integrated intensity of the (220) plane to that of the (111) plane in X-ray diffraction, i.e., I(220) /I(111) value to >=2.0, by which good FCC can be obtd. Furthermore, among FCC, particularly, the one having a Cu matrix is excellent in electromagnation. Since the purity of this Cu exerts a remarkable influence on the fine structure of the coating, the purity of the Cu matrix is preferably regulated to >=6N. Moreover, since the sputtering rate and the uniformity of the coating deteriorate in the case the average grain size is made coarser, it is regulated to <=200μm.</description><subject>ALLOYS</subject><subject>CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>FERROUS OR NON-FERROUS ALLOYS</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TREATMENT OF ALLOYS OR NON-FERROUS METALS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1998</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBzc3ZW8HUNcfRR8PRTCPfwdPZQcA6KDAYJ-Ad5uvqFOIZ4-vspeAYrBLm6h_o4hri6KDj6uSh4hgQrBAT5u4Q6g-R5GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8V4CHoYGhpamZoYGjMTFqAJhnLFc</recordid><startdate>19980728</startdate><enddate>19980728</enddate><creator>TANABE IKU</creator><creator>KANZAKI TOSHIHIRO</creator><scope>EVB</scope></search><sort><creationdate>19980728</creationdate><title>FCC METAL IN WHICH CRYSTAL ORIENTATION IS REGULATED AND ITS PRODUCTION</title><author>TANABE IKU ; KANZAKI TOSHIHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH10195610A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1998</creationdate><topic>ALLOYS</topic><topic>CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>FERROUS OR NON-FERROUS ALLOYS</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TREATMENT OF ALLOYS OR NON-FERROUS METALS</topic><toplevel>online_resources</toplevel><creatorcontrib>TANABE IKU</creatorcontrib><creatorcontrib>KANZAKI TOSHIHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TANABE IKU</au><au>KANZAKI TOSHIHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>FCC METAL IN WHICH CRYSTAL ORIENTATION IS REGULATED AND ITS PRODUCTION</title><date>1998-07-28</date><risdate>1998</risdate><abstract>PROBLEM TO BE SOLVED: To obtain an FCC metal in which crystal orientation is properly regulated and suitable for the material for a sputtering target by regulating the ratio of the integrated intensity of the (200) plane to that of the (111) plane in the crystals to specified value or above. SOLUTION: It is desirable that the FCC metal has (110) priority orientation for securing directivity as for the crystal orientation. As the evaluatio therefor, heat treatment is executed so as to regulate the ratio of the integrated intensity of the (220) plane to that of the (111) plane in X-ray diffraction, i.e., I(220) /I(111) value to >=2.0, by which good FCC can be obtd. Furthermore, among FCC, particularly, the one having a Cu matrix is excellent in electromagnation. Since the purity of this Cu exerts a remarkable influence on the fine structure of the coating, the purity of the Cu matrix is preferably regulated to >=6N. Moreover, since the sputtering rate and the uniformity of the coating deteriorate in the case the average grain size is made coarser, it is regulated to <=200μm.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| subjects | ALLOYS CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF ALLOYS OR NON-FERROUS METALS |
| title | FCC METAL IN WHICH CRYSTAL ORIENTATION IS REGULATED AND ITS PRODUCTION |
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