MODIFICATION OF SURFACE OF NITRIDE AND NITRIDE HAVING IMPROVED SURFACE BY THE SAME
PROBLEM TO BE SOLVED: To obtain the surface of a nitride having preferable interfacial characteristics useful for forming a nitride directly bonded to copper, by irradiating the surface of the nitride with ion particles having energy while directly spraying a reactive gas on the surface of the nitri...
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| creator | SAI GENKOKU CHO KEICHIN KO SHAKUKIN SON YOBAI |
| description | PROBLEM TO BE SOLVED: To obtain the surface of a nitride having preferable interfacial characteristics useful for forming a nitride directly bonded to copper, by irradiating the surface of the nitride with ion particles having energy while directly spraying a reactive gas on the surface of the nitride in a vacuum state. SOLUTION: The surface of a nitride is irradiated with ion particles (an ion gun 2) while spraying a reactive gas 3 on the surface of the nitride in a vacuum state (a vacuum tank 1 and a vacuum pump 4). An oxygen, nitrogen, hydrogen, ammonia, carbon monoxide or their mixed gas is used as the reactive gas. The amount of the reactive gas injected is preferably 1-8ml/min. Argon, oxygen, air, krypton or their mixture can be used as the particles having energy. Preferably, the ion particles have 0.5-2.5KeV energy and 10 -5×10 ion/cm dose. Aluminum nitride is preferable as the nitride. |
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SOLUTION: The surface of a nitride is irradiated with ion particles (an ion gun 2) while spraying a reactive gas 3 on the surface of the nitride in a vacuum state (a vacuum tank 1 and a vacuum pump 4). An oxygen, nitrogen, hydrogen, ammonia, carbon monoxide or their mixed gas is used as the reactive gas. The amount of the reactive gas injected is preferably 1-8ml/min. Argon, oxygen, air, krypton or their mixture can be used as the particles having energy. Preferably, the ion particles have 0.5-2.5KeV energy and 10 -5×10 ion/cm dose. 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SOLUTION: The surface of a nitride is irradiated with ion particles (an ion gun 2) while spraying a reactive gas 3 on the surface of the nitride in a vacuum state (a vacuum tank 1 and a vacuum pump 4). An oxygen, nitrogen, hydrogen, ammonia, carbon monoxide or their mixed gas is used as the reactive gas. The amount of the reactive gas injected is preferably 1-8ml/min. Argon, oxygen, air, krypton or their mixture can be used as the particles having energy. Preferably, the ion particles have 0.5-2.5KeV energy and 10 -5×10 ion/cm dose. 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CHO KEICHIN ; KO SHAKUKIN ; SON YOBAI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH10101459A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1998</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>ARTIFICIAL STONE</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CEMENTS</topic><topic>CERAMICS</topic><topic>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</topic><topic>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS</topic><topic>COMPOUNDS THEREOF</topic><topic>CONCRETE</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>GLASS</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INORGANIC CHEMISTRY</topic><topic>JOINING GLASS TO GLASS OR OTHER MATERIALS</topic><topic>LIME, MAGNESIA</topic><topic>METALLURGY</topic><topic>MINERAL OR SLAG WOOL</topic><topic>NON-METALLIC ELEMENTS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>REFRACTORIES</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SLAG</topic><topic>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</topic><topic>SURFACE TREATMENT OF GLASS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>THEIR RELEVANT APPARATUS</topic><topic>TRANSPORTING</topic><topic>TREATMENT OF NATURAL STONE</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>SAI GENKOKU</creatorcontrib><creatorcontrib>CHO KEICHIN</creatorcontrib><creatorcontrib>KO SHAKUKIN</creatorcontrib><creatorcontrib>SON YOBAI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SAI GENKOKU</au><au>CHO KEICHIN</au><au>KO SHAKUKIN</au><au>SON YOBAI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MODIFICATION OF SURFACE OF NITRIDE AND NITRIDE HAVING IMPROVED SURFACE BY THE SAME</title><date>1998-04-21</date><risdate>1998</risdate><abstract>PROBLEM TO BE SOLVED: To obtain the surface of a nitride having preferable interfacial characteristics useful for forming a nitride directly bonded to copper, by irradiating the surface of the nitride with ion particles having energy while directly spraying a reactive gas on the surface of the nitride in a vacuum state. SOLUTION: The surface of a nitride is irradiated with ion particles (an ion gun 2) while spraying a reactive gas 3 on the surface of the nitride in a vacuum state (a vacuum tank 1 and a vacuum pump 4). An oxygen, nitrogen, hydrogen, ammonia, carbon monoxide or their mixed gas is used as the reactive gas. The amount of the reactive gas injected is preferably 1-8ml/min. Argon, oxygen, air, krypton or their mixture can be used as the particles having energy. Preferably, the ion particles have 0.5-2.5KeV energy and 10 -5×10 ion/cm dose. Aluminum nitride is preferable as the nitride.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ARTIFICIAL STONE BASIC ELECTRIC ELEMENTS CEMENTS CERAMICS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS BASED THEREON COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS COMPOUNDS THEREOF CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL PROCESSES OF COMPOUNDING GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY JOINING GLASS TO GLASS OR OTHER MATERIALS LIME, MAGNESIA METALLURGY MINERAL OR SLAG WOOL NON-METALLIC ELEMENTS ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL REFRACTORIES SEMICONDUCTOR DEVICES SLAG SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR PREPARATION OR CHEMICAL WORKING-UP THEIR RELEVANT APPARATUS TRANSPORTING TREATMENT OF NATURAL STONE WORKING-UP |
| title | MODIFICATION OF SURFACE OF NITRIDE AND NITRIDE HAVING IMPROVED SURFACE BY THE SAME |
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