FRICTIONAL RESISTANCE REDUCING AGENT FOR AQUEOUS MEDIUM AND FRICTIONAL RESISTANCE REDUCTION METHOD FOR AQUEOUS MEDIUM USING THE AGENT
PROBLEM TO BE SOLVED: To obtain a frictional resistance reducing agent free from precipitation at a low temperature, stably usable for a long time, capable of reducing the frictional resistance of an aqueous medium in a wide temperature range and useful for a heating-cooling system in an industrial...
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| creator | WAKUI TSUGIO SUGAWARA HITOSHI |
| description | PROBLEM TO BE SOLVED: To obtain a frictional resistance reducing agent free from precipitation at a low temperature, stably usable for a long time, capable of reducing the frictional resistance of an aqueous medium in a wide temperature range and useful for a heating-cooling system in an industrial plant, etc., by compounding a specific quaternary ammonium cation with an organic acid residue. SOLUTION: This frictional resistance reducing agent is composed of (A) a cation of formula I R is a 8-22C (branched) (un)saturated aliphatic hydrocarbon; R and R are each a group of formula II [Z is H or methyl; (n)=1-5]; R is R , R , methyl or ethyl; Y is O, CONH or COO; (m)=1-5} and (B) an organic acid residue. For instance, the frictional resistance reducing agent is composed of a salt of the component A [e.g. lauryloxypropyldi(hydroxyetyl) methylammonium chloride] and an organic acid salt [e.g. sodium salicylate]. |
| format | Patent |
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SOLUTION: This frictional resistance reducing agent is composed of (A) a cation of formula I R is a 8-22C (branched) (un)saturated aliphatic hydrocarbon; R and R are each a group of formula II [Z is H or methyl; (n)=1-5]; R is R , R , methyl or ethyl; Y is O, CONH or COO; (m)=1-5} and (B) an organic acid residue. For instance, the frictional resistance reducing agent is composed of a salt of the component A [e.g. lauryloxypropyldi(hydroxyetyl) methylammonium chloride] and an organic acid salt [e.g. sodium salicylate].</description><edition>6</edition><language>eng</language><subject>ADHESIVES ; CHEMISTRY ; DYES ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; POLISHES</subject><creationdate>1997</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19970331&DB=EPODOC&CC=JP&NR=H0987610A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19970331&DB=EPODOC&CC=JP&NR=H0987610A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WAKUI TSUGIO</creatorcontrib><creatorcontrib>SUGAWARA HITOSHI</creatorcontrib><title>FRICTIONAL RESISTANCE REDUCING AGENT FOR AQUEOUS MEDIUM AND FRICTIONAL RESISTANCE REDUCTION METHOD FOR AQUEOUS MEDIUM USING THE AGENT</title><description>PROBLEM TO BE SOLVED: To obtain a frictional resistance reducing agent free from precipitation at a low temperature, stably usable for a long time, capable of reducing the frictional resistance of an aqueous medium in a wide temperature range and useful for a heating-cooling system in an industrial plant, etc., by compounding a specific quaternary ammonium cation with an organic acid residue. SOLUTION: This frictional resistance reducing agent is composed of (A) a cation of formula I R is a 8-22C (branched) (un)saturated aliphatic hydrocarbon; R and R are each a group of formula II [Z is H or methyl; (n)=1-5]; R is R , R , methyl or ethyl; Y is O, CONH or COO; (m)=1-5} and (B) an organic acid residue. For instance, the frictional resistance reducing agent is composed of a salt of the component A [e.g. lauryloxypropyldi(hydroxyetyl) methylammonium chloride] and an organic acid salt [e.g. sodium salicylate].</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DYES</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>POLISHES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1997</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZGh1C_J0DvH093P0UQhyDfYMDnH0c3YFMl1CnT393BUc3V39QhTc_IMUHANDXf1DgxV8XV08Q30VHP1cFPDoBQkDlYZ4-Ltg0x0aDDI8xMMVYgEPA2taYk5xKi-U5mZQcHMNcfbQTS3Ij08tLkhMTs1LLYn3CvAwsLQwNzM0cDQmQgkAT2A9jw</recordid><startdate>19970331</startdate><enddate>19970331</enddate><creator>WAKUI TSUGIO</creator><creator>SUGAWARA HITOSHI</creator><scope>EVB</scope></search><sort><creationdate>19970331</creationdate><title>FRICTIONAL RESISTANCE REDUCING AGENT FOR AQUEOUS MEDIUM AND FRICTIONAL RESISTANCE REDUCTION METHOD FOR AQUEOUS MEDIUM USING THE AGENT</title><author>WAKUI TSUGIO ; SUGAWARA HITOSHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH0987610A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1997</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DYES</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>POLISHES</topic><toplevel>online_resources</toplevel><creatorcontrib>WAKUI TSUGIO</creatorcontrib><creatorcontrib>SUGAWARA HITOSHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WAKUI TSUGIO</au><au>SUGAWARA HITOSHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>FRICTIONAL RESISTANCE REDUCING AGENT FOR AQUEOUS MEDIUM AND FRICTIONAL RESISTANCE REDUCTION METHOD FOR AQUEOUS MEDIUM USING THE AGENT</title><date>1997-03-31</date><risdate>1997</risdate><abstract>PROBLEM TO BE SOLVED: To obtain a frictional resistance reducing agent free from precipitation at a low temperature, stably usable for a long time, capable of reducing the frictional resistance of an aqueous medium in a wide temperature range and useful for a heating-cooling system in an industrial plant, etc., by compounding a specific quaternary ammonium cation with an organic acid residue. SOLUTION: This frictional resistance reducing agent is composed of (A) a cation of formula I R is a 8-22C (branched) (un)saturated aliphatic hydrocarbon; R and R are each a group of formula II [Z is H or methyl; (n)=1-5]; R is R , R , methyl or ethyl; Y is O, CONH or COO; (m)=1-5} and (B) an organic acid residue. For instance, the frictional resistance reducing agent is composed of a salt of the component A [e.g. lauryloxypropyldi(hydroxyetyl) methylammonium chloride] and an organic acid salt [e.g. sodium salicylate].</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES CHEMISTRY DYES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES |
| title | FRICTIONAL RESISTANCE REDUCING AGENT FOR AQUEOUS MEDIUM AND FRICTIONAL RESISTANCE REDUCTION METHOD FOR AQUEOUS MEDIUM USING THE AGENT |
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