ELECTRON BEAM OBSERVING METHOD AND MONITORING DEVICE

ELECTRON BEAM OBSERVING METHOD AND MONITORING DEVICE

PROBLEM TO BE SOLVED: To provide an electron beam observing method and a monitoring device capable observing only reflection electrons discharged from the fine area of sample surface on which electron beams are irradiated. SOLUTION: An electron beam intermitting means 3 is arranged on the optical ax...

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1. Verfasser: OKAMURA SHIGERU
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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creator OKAMURA SHIGERU
description PROBLEM TO BE SOLVED: To provide an electron beam observing method and a monitoring device capable observing only reflection electrons discharged from the fine area of sample surface on which electron beams are irradiated. SOLUTION: An electron beam intermitting means 3 is arranged on the optical axis of an electronic lens system by which observing irradiation beam 1a is converged and imaged, an electron beam shutdown voltage is applied to the electron beam intermitting means 3 at an arbitrary time interval, the irradiation electron beam 1a is intermittently passed off from the optical axis, reflection electrons discharged by scanning and irradiating the observed surfaces of samples by means of the passed irradiation electron beam are returned back to the electronic lens system 12, the converged and imaged reflection electron beam is removed from the optical axis of the electronic lens system 12 with said irradiation electron beam cutoff timing, and the strength of the removed reflection electron beam only observed by means of a reflection electron detection means 10.
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SOLUTION: An electron beam intermitting means 3 is arranged on the optical axis of an electronic lens system by which observing irradiation beam 1a is converged and imaged, an electron beam shutdown voltage is applied to the electron beam intermitting means 3 at an arbitrary time interval, the irradiation electron beam 1a is intermittently passed off from the optical axis, reflection electrons discharged by scanning and irradiating the observed surfaces of samples by means of the passed irradiation electron beam are returned back to the electronic lens system 12, the converged and imaged reflection electron beam is removed from the optical axis of the electronic lens system 12 with said irradiation electron beam cutoff timing, and the strength of the removed reflection electron beam only observed by means of a reflection electron detection means 10.</description><edition>6</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>1997</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19970922&amp;DB=EPODOC&amp;CC=JP&amp;NR=H09251847A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19970922&amp;DB=EPODOC&amp;CC=JP&amp;NR=H09251847A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OKAMURA SHIGERU</creatorcontrib><title>ELECTRON BEAM OBSERVING METHOD AND MONITORING DEVICE</title><description>PROBLEM TO BE SOLVED: To provide an electron beam observing method and a monitoring device capable observing only reflection electrons discharged from the fine area of sample surface on which electron beams are irradiated. 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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title ELECTRON BEAM OBSERVING METHOD AND MONITORING DEVICE
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