MANUFACTURE OF SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To obtain a semiconductor device which eliminates a cause obstructing the performance of a high-speed operation when a bipolar transistor is formed, in with the performance of the high-speed operation of every transistor is not different when, e.g. the effective emitter size of...

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Bibliographische Detailangaben
1. Verfasser: SHINOHARA MAMORU
Format: Patent
Sprache:eng
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