PROJECTION ALIGNER

PROBLEM TO BE SOLVED: To provide a projection aligner allowing it to avoid exposure in an underset state of a reticule and a sensitive substrate inspite of setting a large- sized and heavy weight substrate stage. SOLUTION: A reticule alignment controller 42 performing a constant servo- driving contr...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WATANABE SATOYUKI, YANAGIHARA MASAMITSU, HIRACHI KAZUYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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