MANUFACTURE OF SEMICONDUCTOR ELEMENT IN WHICH REAR SURFACE OF WAFER IS POLISHED BY UV OVERSENSITIVE TAPE

PROBLEM TO BE SOLVED: To avoid using other chemical substance for removing an UV-sensitive tape, etc., from a semiconductor wafer by removing the tape with irradiation of ultraviolet rays on the surface of the wafer by a new wafer back side polishing step. SOLUTION: An UV-sensible tape 35 is laid on...

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Bibliographische Detailangaben
Hauptverfasser: KOU DOIN, CHIN SEIMIN
Format: Patent
Sprache:eng
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