X-RAY GENERATING DEVICE

X-RAY GENERATING DEVICE

PURPOSE: To generate an X-ray having a strong energy by simplifying the structure of the multilayer film target of an X-ray generating device and selecting optional film thickness and film thickness interval. CONSTITUTION: In an X-ray generating device for emitting an electron beam to a multilayer f...

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Hauptverfasser: ENDO ICHITA, SATO YOSHIHISA, SEKIMURA MASAYUKI, NAKAYAMA KOICHI
Format: Patent
Sprache:eng
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ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
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creator ENDO ICHITA
SATO YOSHIHISA
SEKIMURA MASAYUKI
NAKAYAMA KOICHI
description PURPOSE: To generate an X-ray having a strong energy by simplifying the structure of the multilayer film target of an X-ray generating device and selecting optional film thickness and film thickness interval. CONSTITUTION: In an X-ray generating device for emitting an electron beam to a multilayer film target 13 to generate a multiply interfered X-ray, the multilayer film target 13 is formed by laminating a plurality of thin films such as silicon wafer formed in such a manner that the film thickness of a thin film part forming the passing area of the electron beam is thinner than the film thickness other than the part forming the passing area, with the thick part of the thin film as a spacer.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH0896986A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH0896986A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH0896986A3</originalsourceid><addsrcrecordid>eNrjZBCP0A1yjFRwd_VzDXIM8fRzV3BxDfN0duVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfFeAR4GFpZmlhZmjsZEKAEAk28fPw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>X-RAY GENERATING DEVICE</title><source>esp@cenet</source><creator>ENDO ICHITA ; SATO YOSHIHISA ; SEKIMURA MASAYUKI ; NAKAYAMA KOICHI</creator><creatorcontrib>ENDO ICHITA ; SATO YOSHIHISA ; SEKIMURA MASAYUKI ; NAKAYAMA KOICHI</creatorcontrib><description>PURPOSE: To generate an X-ray having a strong energy by simplifying the structure of the multilayer film target of an X-ray generating device and selecting optional film thickness and film thickness interval. CONSTITUTION: In an X-ray generating device for emitting an electron beam to a multilayer film target 13 to generate a multiply interfered X-ray, the multilayer film target 13 is formed by laminating a plurality of thin films such as silicon wafer formed in such a manner that the film thickness of a thin film part forming the passing area of the electron beam is thinner than the film thickness other than the part forming the passing area, with the thick part of the thin film as a spacer.</description><edition>6</edition><language>eng</language><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; X-RAY TECHNIQUE</subject><creationdate>1996</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19960412&amp;DB=EPODOC&amp;CC=JP&amp;NR=H0896986A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19960412&amp;DB=EPODOC&amp;CC=JP&amp;NR=H0896986A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ENDO ICHITA</creatorcontrib><creatorcontrib>SATO YOSHIHISA</creatorcontrib><creatorcontrib>SEKIMURA MASAYUKI</creatorcontrib><creatorcontrib>NAKAYAMA KOICHI</creatorcontrib><title>X-RAY GENERATING DEVICE</title><description>PURPOSE: To generate an X-ray having a strong energy by simplifying the structure of the multilayer film target of an X-ray generating device and selecting optional film thickness and film thickness interval. CONSTITUTION: In an X-ray generating device for emitting an electron beam to a multilayer film target 13 to generate a multiply interfered X-ray, the multilayer film target 13 is formed by laminating a plurality of thin films such as silicon wafer formed in such a manner that the film thickness of a thin film part forming the passing area of the electron beam is thinner than the film thickness other than the part forming the passing area, with the thick part of the thin film as a spacer.</description><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>X-RAY TECHNIQUE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1996</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBCP0A1yjFRwd_VzDXIM8fRzV3BxDfN0duVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfFeAR4GFpZmlhZmjsZEKAEAk28fPw</recordid><startdate>19960412</startdate><enddate>19960412</enddate><creator>ENDO ICHITA</creator><creator>SATO YOSHIHISA</creator><creator>SEKIMURA MASAYUKI</creator><creator>NAKAYAMA KOICHI</creator><scope>EVB</scope></search><sort><creationdate>19960412</creationdate><title>X-RAY GENERATING DEVICE</title><author>ENDO ICHITA ; SATO YOSHIHISA ; SEKIMURA MASAYUKI ; NAKAYAMA KOICHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH0896986A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1996</creationdate><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>X-RAY TECHNIQUE</topic><toplevel>online_resources</toplevel><creatorcontrib>ENDO ICHITA</creatorcontrib><creatorcontrib>SATO YOSHIHISA</creatorcontrib><creatorcontrib>SEKIMURA MASAYUKI</creatorcontrib><creatorcontrib>NAKAYAMA KOICHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ENDO ICHITA</au><au>SATO YOSHIHISA</au><au>SEKIMURA MASAYUKI</au><au>NAKAYAMA KOICHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>X-RAY GENERATING DEVICE</title><date>1996-04-12</date><risdate>1996</risdate><abstract>PURPOSE: To generate an X-ray having a strong energy by simplifying the structure of the multilayer film target of an X-ray generating device and selecting optional film thickness and film thickness interval. CONSTITUTION: In an X-ray generating device for emitting an electron beam to a multilayer film target 13 to generate a multiply interfered X-ray, the multilayer film target 13 is formed by laminating a plurality of thin films such as silicon wafer formed in such a manner that the film thickness of a thin film part forming the passing area of the electron beam is thinner than the film thickness other than the part forming the passing area, with the thick part of the thin film as a spacer.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record>
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subjects ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
title X-RAY GENERATING DEVICE
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-14T00%3A35%3A23IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=ENDO%20ICHITA&rft.date=1996-04-12&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPH0896986A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true