HEAT TREATMENT FURNACE FOR SEMICONDUCTOR SUBSTRATE

PURPOSE:To provide a heat treatment furnace for semiconductor substrate which is capable of significantly reducing the metal contamination level of a heat-treated semiconductor substrate. CONSTITUTION:A heat treatment furnace has a furnace tube 4 located on a base plate 1 and housing a boat 5 therei...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KUBOTA ATSUKO, AMAI TSUTOMU, SAMATA SHUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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