FORMATION OF PATTERN

PURPOSE: To provide a patterning method for photomasks, etc., by a lift-off method necessitating just one time of patterning. CONSTITUTION: A mask 13A for plating is disposed on a conductive layer 11 on a transparent substrate 10 and is then subjected to plating, by which plating films 15 are select...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	TAKEI SHIGEO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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