METHOD AND APPARATUS FOR DRAWING OF PATTERN

PURPOSE:To draw a pattern with high sensitivity while its high resolution is being maintained. CONSTITUTION:When a very small pattern 21a as one of mutually isolated very small patterns is drawn on a resist film 2 which has been spread on the surface of a semiconductor wafer, an electron beam 3 is s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KATOU TAKAAKI, IMANAGA YUUJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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