MANUFACTURE OF SEMICONDUCTOR DEVICE

PURPOSE: To restrain a wiring layer of laminated structure composed of a metal silicide and a silicon layer and a semiconductor substrate which serves as ground from increasing the contact resistance between the wiring layer and the substrate. CONSTITUTION: Positive resist is applied onto a silicon...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	TSUCHIMOTO JUNICHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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