PHOTO-MASK

PURPOSE: To prevent an ill effect caused by the sticking of foreign matter and the like by forming a photo-mask itself with a nontranslucent material, using a translucent region formed on this material as a translucent region portion, and using the other region as a shielding region portion. CONSTIT...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SUGITANI SATOYUKI, HAMAMOTO TATSUO, KUJI TAKAAKI, IZUMI AKIYA, SHIMIZU HIROMASA, KUBO AKIKO, TSUBOKA TOMOAKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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