FOREIGN OBJECT ANALYTICAL DEVICE AND METHOD, AND SEMICONDUCTOR MANUFACTURE CONTROL DEVICE AND METHOD
PURPOSE: To provide an analytical device capable of quickly analyzing many foreign objects without a professional judgment made by a skilled analyst. CONSTITUTION: A foreign object analytical device is equipped with a scanning electron microscope(SEM) 2 through which the elemental composition ratio...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE: To provide an analytical device capable of quickly analyzing many foreign objects without a professional judgment made by a skilled analyst. CONSTITUTION: A foreign object analytical device is equipped with a scanning electron microscope(SEM) 2 through which the elemental composition ratio of foreign objects attached to a semiconductor wafer is obtained, a foreign object plot section 10 through which the distribution of foreign objects is obtained for each composition based on the analytical result of the SEM 2, a foreign object classifying section 11 through which the foreign objects are classified on the basis of the distribution of foreign objects, and a foreign object specifying section 12 which specifies the kinds of foreign objects comparing the foreign object classification result with the content of a previously set foreign object data base 13. |
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