TREATING METHOD DEVICE FOR PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE

PURPOSE:To provide a treating method and a device for a photosensitive planographic printing plate by which development can be always stably and rapidly done, the amt. of a development replenisher can be easily controlled, and the frequency for exchanging liquids is small, and the consumed amt. of t...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SUGAIWA TAKAYUKI, WATANABE SHINYA, FUKUMURO IKU, UEHARA MASABUMI, OTA TOMOHISA
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator SUGAIWA TAKAYUKI
WATANABE SHINYA
FUKUMURO IKU
UEHARA MASABUMI
OTA TOMOHISA
description PURPOSE:To provide a treating method and a device for a photosensitive planographic printing plate by which development can be always stably and rapidly done, the amt. of a development replenisher can be easily controlled, and the frequency for exchanging liquids is small, and the consumed amt. of the developer is little. CONSTITUTION:A photosensitive planographic printing plate S is automatically carried in an automatic developing machine while an alkali developer substantially not used is supplied on the printing plate for development, and further, the plate is subjected to dip development. When the plate is dipped for development, a promoting means (rubbing with shower 24 in a liquid, brush 26, and sponge or circulating the developer) is used. Further, a developer substantially not used is supllied in misty state on the plate.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH075696A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH075696A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH075696A3</originalsourceid><addsrcrecordid>eNrjZHANCXJ1DPH0c1fwdQ3x8HdRcHEN83R2VXDzD1II8PAP8Q929Qv2DPEMc1UI8HH083cPcgzw8HRWCAjy9ANrA4qGuPIwsKYl5hSn8kJpbgZ5N9cQZw_d1IL8-NTigsTk1LzUknivAA8Dc1MzSzNHY8IqAAl0K98</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>TREATING METHOD DEVICE FOR PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE</title><source>esp@cenet</source><creator>SUGAIWA TAKAYUKI ; WATANABE SHINYA ; FUKUMURO IKU ; UEHARA MASABUMI ; OTA TOMOHISA</creator><creatorcontrib>SUGAIWA TAKAYUKI ; WATANABE SHINYA ; FUKUMURO IKU ; UEHARA MASABUMI ; OTA TOMOHISA</creatorcontrib><description>PURPOSE:To provide a treating method and a device for a photosensitive planographic printing plate by which development can be always stably and rapidly done, the amt. of a development replenisher can be easily controlled, and the frequency for exchanging liquids is small, and the consumed amt. of the developer is little. CONSTITUTION:A photosensitive planographic printing plate S is automatically carried in an automatic developing machine while an alkali developer substantially not used is supplied on the printing plate for development, and further, the plate is subjected to dip development. When the plate is dipped for development, a promoting means (rubbing with shower 24 in a liquid, brush 26, and sponge or circulating the developer) is used. Further, a developer substantially not used is supllied in misty state on the plate.</description><edition>6</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>1995</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19950110&amp;DB=EPODOC&amp;CC=JP&amp;NR=H075696A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19950110&amp;DB=EPODOC&amp;CC=JP&amp;NR=H075696A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SUGAIWA TAKAYUKI</creatorcontrib><creatorcontrib>WATANABE SHINYA</creatorcontrib><creatorcontrib>FUKUMURO IKU</creatorcontrib><creatorcontrib>UEHARA MASABUMI</creatorcontrib><creatorcontrib>OTA TOMOHISA</creatorcontrib><title>TREATING METHOD DEVICE FOR PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE</title><description>PURPOSE:To provide a treating method and a device for a photosensitive planographic printing plate by which development can be always stably and rapidly done, the amt. of a development replenisher can be easily controlled, and the frequency for exchanging liquids is small, and the consumed amt. of the developer is little. CONSTITUTION:A photosensitive planographic printing plate S is automatically carried in an automatic developing machine while an alkali developer substantially not used is supplied on the printing plate for development, and further, the plate is subjected to dip development. When the plate is dipped for development, a promoting means (rubbing with shower 24 in a liquid, brush 26, and sponge or circulating the developer) is used. Further, a developer substantially not used is supllied in misty state on the plate.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1995</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHANCXJ1DPH0c1fwdQ3x8HdRcHEN83R2VXDzD1II8PAP8Q929Qv2DPEMc1UI8HH083cPcgzw8HRWCAjy9ANrA4qGuPIwsKYl5hSn8kJpbgZ5N9cQZw_d1IL8-NTigsTk1LzUknivAA8Dc1MzSzNHY8IqAAl0K98</recordid><startdate>19950110</startdate><enddate>19950110</enddate><creator>SUGAIWA TAKAYUKI</creator><creator>WATANABE SHINYA</creator><creator>FUKUMURO IKU</creator><creator>UEHARA MASABUMI</creator><creator>OTA TOMOHISA</creator><scope>EVB</scope></search><sort><creationdate>19950110</creationdate><title>TREATING METHOD DEVICE FOR PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE</title><author>SUGAIWA TAKAYUKI ; WATANABE SHINYA ; FUKUMURO IKU ; UEHARA MASABUMI ; OTA TOMOHISA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH075696A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1995</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>SUGAIWA TAKAYUKI</creatorcontrib><creatorcontrib>WATANABE SHINYA</creatorcontrib><creatorcontrib>FUKUMURO IKU</creatorcontrib><creatorcontrib>UEHARA MASABUMI</creatorcontrib><creatorcontrib>OTA TOMOHISA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SUGAIWA TAKAYUKI</au><au>WATANABE SHINYA</au><au>FUKUMURO IKU</au><au>UEHARA MASABUMI</au><au>OTA TOMOHISA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TREATING METHOD DEVICE FOR PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE</title><date>1995-01-10</date><risdate>1995</risdate><abstract>PURPOSE:To provide a treating method and a device for a photosensitive planographic printing plate by which development can be always stably and rapidly done, the amt. of a development replenisher can be easily controlled, and the frequency for exchanging liquids is small, and the consumed amt. of the developer is little. CONSTITUTION:A photosensitive planographic printing plate S is automatically carried in an automatic developing machine while an alkali developer substantially not used is supplied on the printing plate for development, and further, the plate is subjected to dip development. When the plate is dipped for development, a promoting means (rubbing with shower 24 in a liquid, brush 26, and sponge or circulating the developer) is used. Further, a developer substantially not used is supllied in misty state on the plate.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JPH075696A
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title TREATING METHOD DEVICE FOR PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T17%3A52%3A02IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SUGAIWA%20TAKAYUKI&rft.date=1995-01-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPH075696A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true