ETCHING OF ORGANIC FILM

PURPOSE:To obtain an anisotropic pattern shape irrespective of the density of patterns by treating a substrate by a rare hydrofluoric acid solution after etching an organic film formed on the substrate by means of a dry etching method using mixed gas in which halogen gas or gas containing halogen is...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	IGAWA EIJI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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