CHITIN-OR CHITOSAN-DISPERSED SOLUTION AND METHOD USING THE SAME
PURPOSE:To obtain the subject uniform dispersion capable of industrially molding and processing chitin or chitosan or making into its derivatives by dispersing chitin or chitosan into a vinyl-based resin monomer, swelling and partially dissolving. CONSTITUTION:Chitin or chitosan is dispersed into a...
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creator | TSUJIMURA TETSUZO KORIYAMA TAKESHI FUJII SHOJI AKAMATSU KIYOSHI |
description | PURPOSE:To obtain the subject uniform dispersion capable of industrially molding and processing chitin or chitosan or making into its derivatives by dispersing chitin or chitosan into a vinyl-based resin monomer, swelling and partially dissolving. CONSTITUTION:Chitin or chitosan is dispersed into a vinyl-based resin monomer [preferably (meth)acryloyl or vinyl-containing vinyl monomer such as acrylic ester of phenylglycidyl ether], swollen and partially dissolved to give the objective dispersion. The dispersion comprises |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH06263919A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH06263919A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH06263919A3</originalsourceid><addsrcrecordid>eNrjZLB39vAM8fTT9Q9SALH8gx39dF08gwNcg4JdXRSC_X1CQzz9_RQc_VwUfF1DPPxdFEKDPf3cFUI8XBWCHX1deRhY0xJzilN5oTQ3g6Kba4izh25qQX58anFBYnJqXmpJvFeAh4GZkZmxpaGlozExagCNdCqk</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CHITIN-OR CHITOSAN-DISPERSED SOLUTION AND METHOD USING THE SAME</title><source>esp@cenet</source><creator>TSUJIMURA TETSUZO ; KORIYAMA TAKESHI ; FUJII SHOJI ; AKAMATSU KIYOSHI</creator><creatorcontrib>TSUJIMURA TETSUZO ; KORIYAMA TAKESHI ; FUJII SHOJI ; AKAMATSU KIYOSHI</creatorcontrib><description>PURPOSE:To obtain the subject uniform dispersion capable of industrially molding and processing chitin or chitosan or making into its derivatives by dispersing chitin or chitosan into a vinyl-based resin monomer, swelling and partially dissolving. CONSTITUTION:Chitin or chitosan is dispersed into a vinyl-based resin monomer [preferably (meth)acryloyl or vinyl-containing vinyl monomer such as acrylic ester of phenylglycidyl ether], swollen and partially dissolved to give the objective dispersion. The dispersion comprises <=20wt.% chitin or chitosan. To cure this dispersion, the vinyl-based resin is preferably polymerized by radical light irradiation polymerization. Formation of a derivative of chitin or chitosan is preferably obtained by reacting the dispersion with a modifier composed of a reagent having reactivity with hydroxyl group or amino group and removing the vinyl-based resin monomer.</description><edition>5</edition><language>eng</language><subject>CHEMISTRY ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; DERIVATIVES THEREOF ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; POLYSACCHARIDES ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>1994</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19940920&DB=EPODOC&CC=JP&NR=H06263919A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19940920&DB=EPODOC&CC=JP&NR=H06263919A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TSUJIMURA TETSUZO</creatorcontrib><creatorcontrib>KORIYAMA TAKESHI</creatorcontrib><creatorcontrib>FUJII SHOJI</creatorcontrib><creatorcontrib>AKAMATSU KIYOSHI</creatorcontrib><title>CHITIN-OR CHITOSAN-DISPERSED SOLUTION AND METHOD USING THE SAME</title><description>PURPOSE:To obtain the subject uniform dispersion capable of industrially molding and processing chitin or chitosan or making into its derivatives by dispersing chitin or chitosan into a vinyl-based resin monomer, swelling and partially dissolving. CONSTITUTION:Chitin or chitosan is dispersed into a vinyl-based resin monomer [preferably (meth)acryloyl or vinyl-containing vinyl monomer such as acrylic ester of phenylglycidyl ether], swollen and partially dissolved to give the objective dispersion. The dispersion comprises <=20wt.% chitin or chitosan. To cure this dispersion, the vinyl-based resin is preferably polymerized by radical light irradiation polymerization. Formation of a derivative of chitin or chitosan is preferably obtained by reacting the dispersion with a modifier composed of a reagent having reactivity with hydroxyl group or amino group and removing the vinyl-based resin monomer.</description><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>DERIVATIVES THEREOF</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>POLYSACCHARIDES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1994</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLB39vAM8fTT9Q9SALH8gx39dF08gwNcg4JdXRSC_X1CQzz9_RQc_VwUfF1DPPxdFEKDPf3cFUI8XBWCHX1deRhY0xJzilN5oTQ3g6Kba4izh25qQX58anFBYnJqXmpJvFeAh4GZkZmxpaGlozExagCNdCqk</recordid><startdate>19940920</startdate><enddate>19940920</enddate><creator>TSUJIMURA TETSUZO</creator><creator>KORIYAMA TAKESHI</creator><creator>FUJII SHOJI</creator><creator>AKAMATSU KIYOSHI</creator><scope>EVB</scope></search><sort><creationdate>19940920</creationdate><title>CHITIN-OR CHITOSAN-DISPERSED SOLUTION AND METHOD USING THE SAME</title><author>TSUJIMURA TETSUZO ; KORIYAMA TAKESHI ; FUJII SHOJI ; AKAMATSU KIYOSHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH06263919A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1994</creationdate><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>DERIVATIVES THEREOF</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>POLYSACCHARIDES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>TSUJIMURA TETSUZO</creatorcontrib><creatorcontrib>KORIYAMA TAKESHI</creatorcontrib><creatorcontrib>FUJII SHOJI</creatorcontrib><creatorcontrib>AKAMATSU KIYOSHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TSUJIMURA TETSUZO</au><au>KORIYAMA TAKESHI</au><au>FUJII SHOJI</au><au>AKAMATSU KIYOSHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CHITIN-OR CHITOSAN-DISPERSED SOLUTION AND METHOD USING THE SAME</title><date>1994-09-20</date><risdate>1994</risdate><abstract>PURPOSE:To obtain the subject uniform dispersion capable of industrially molding and processing chitin or chitosan or making into its derivatives by dispersing chitin or chitosan into a vinyl-based resin monomer, swelling and partially dissolving. CONSTITUTION:Chitin or chitosan is dispersed into a vinyl-based resin monomer [preferably (meth)acryloyl or vinyl-containing vinyl monomer such as acrylic ester of phenylglycidyl ether], swollen and partially dissolved to give the objective dispersion. The dispersion comprises <=20wt.% chitin or chitosan. To cure this dispersion, the vinyl-based resin is preferably polymerized by radical light irradiation polymerization. Formation of a derivative of chitin or chitosan is preferably obtained by reacting the dispersion with a modifier composed of a reagent having reactivity with hydroxyl group or amino group and removing the vinyl-based resin monomer.</abstract><edition>5</edition><oa>free_for_read</oa></addata></record> |
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subjects | CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS DERIVATIVES THEREOF METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS POLYSACCHARIDES THEIR PREPARATION OR CHEMICAL WORKING-UP |
title | CHITIN-OR CHITOSAN-DISPERSED SOLUTION AND METHOD USING THE SAME |
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