GASEOUS CLEANING AGENT FOR CLEANSING METAL-CONTAINING DIRT FROM SUBSTRATE AND CLEANING OF SUBSTRATE THEREWITH

This invention is a vapor-phase process for cleaning metal-containing contaminants from the surfaces of integrated circuits and semiconductors between the numerous fabricating steps required to manufacture the finished electronic devices. The process employs cleaning agents comprising an effective a...

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Hauptverfasser: DEIBUITSUDO AASAA BOURINGU, MAAKU AREN JIYOOJI
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creator DEIBUITSUDO AASAA BOURINGU
MAAKU AREN JIYOOJI
description This invention is a vapor-phase process for cleaning metal-containing contaminants from the surfaces of integrated circuits and semiconductors between the numerous fabricating steps required to manufacture the finished electronic devices. The process employs cleaning agents comprising an effective amount of hexamethyldisilazane. The process comprises contacting the surface to be cleaned with an effective amount of the desired cleaning agent at a temperature sufficient to form volatile metal-ligand complexes on the surface of the substrate to be cleaned. The volatile metal-ligand complexes are sublimed from the surfaces of the substrate providing a clean, substantially residue-free surface.
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subjects ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
BASIC ELECTRIC ELEMENTS
CANDLES
CHEMISTRY
COMPOUNDS THEREOF
DETERGENT COMPOSITIONS
DETERGENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FATTY ACIDS THEREFROM
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
RECOVERY OF GLYCEROL
RESIN SOAPS
SEMICONDUCTOR DEVICES
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
title GASEOUS CLEANING AGENT FOR CLEANSING METAL-CONTAINING DIRT FROM SUBSTRATE AND CLEANING OF SUBSTRATE THEREWITH
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