JPH0619670B

An automatic accurate alignment system for positioning at a required position an object to be worked which has a certain pattern on its surface. The system includes a key pattern memory, a pattern matching device and movement control device. The key pattern memory memorizes a first signal indicative...

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1. Verfasser:	UGA MASANORI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS REGULATING SEMICONDUCTOR DEVICES SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES TESTING
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creator	UGA MASANORI
description	An automatic accurate alignment system for positioning at a required position an object to be worked which has a certain pattern on its surface. The system includes a key pattern memory, a pattern matching device and movement control device. The key pattern memory memorizes a first signal indicative of a key pattern existing in a specified area and its position when the object to be worked is positioned at a predetermined position, and memorizes a second signal indicative of the key pattern existing in the specified area and its position when the object to be worked is rotated through 90 degrees from the predetermined the second signal is determined from the first signal. The pattern matching device performs a first pattern matching on the basis of the first signal and a second pattern matching on the basis of the second signal. The movement control device performs a first positioning of the object to be worked on the basis of the first pattern matching, then, rotates the object to be worked through 90 degrees, and thereafter, performs a second positioning of the object to be worked on the basis of the second pattern matching.
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The key pattern memory memorizes a first signal indicative of a key pattern existing in a specified area and its position when the object to be worked is positioned at a predetermined position, and memorizes a second signal indicative of the key pattern existing in the specified area and its position when the object to be worked is rotated through 90 degrees from the predetermined the second signal is determined from the first signal. The pattern matching device performs a first pattern matching on the basis of the first signal and a second pattern matching on the basis of the second signal. The movement control device performs a first positioning of the object to be worked on the basis of the first pattern matching, then, rotates the object to be worked through 90 degrees, and thereafter, performs a second positioning of the object to be worked on the basis of the second pattern matching.</description><edition>5</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CONTROLLING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; PHYSICS ; REGULATING ; SEMICONDUCTOR DEVICES ; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES ; TESTING</subject><creationdate>1994</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19940316&DB=EPODOC&CC=JP&NR=H0619670B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19940316&DB=EPODOC&CC=JP&NR=H0619670B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>UGA MASANORI</creatorcontrib><title>JPH0619670B</title><description>An automatic accurate alignment system for positioning at a required position an object to be worked which has a certain pattern on its surface. The system includes a key pattern memory, a pattern matching device and movement control device. The key pattern memory memorizes a first signal indicative of a key pattern existing in a specified area and its position when the object to be worked is positioned at a predetermined position, and memorizes a second signal indicative of the key pattern existing in the specified area and its position when the object to be worked is rotated through 90 degrees from the predetermined the second signal is determined from the first signal. The pattern matching device performs a first pattern matching on the basis of the first signal and a second pattern matching on the basis of the second signal. The movement control device performs a first positioning of the object to be worked on the basis of the first pattern matching, then, rotates the object to be worked through 90 degrees, and thereafter, performs a second positioning of the object to be worked on the basis of the second pattern matching.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CONTROLLING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>REGULATING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1994</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOD2CvAwMDO0NDM3cOJhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFIOpyMjIlSBAB88xxL</recordid><startdate>19940316</startdate><enddate>19940316</enddate><creator>UGA MASANORI</creator><scope>EVB</scope></search><sort><creationdate>19940316</creationdate><title>JPH0619670B</title><author>UGA MASANORI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH0619670BB23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1994</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CONTROLLING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>REGULATING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>UGA MASANORI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>UGA MASANORI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>JPH0619670B</title><date>1994-03-16</date><risdate>1994</risdate><abstract>An automatic accurate alignment system for positioning at a required position an object to be worked which has a certain pattern on its surface. The system includes a key pattern memory, a pattern matching device and movement control device. The key pattern memory memorizes a first signal indicative of a key pattern existing in a specified area and its position when the object to be worked is positioned at a predetermined position, and memorizes a second signal indicative of the key pattern existing in the specified area and its position when the object to be worked is rotated through 90 degrees from the predetermined the second signal is determined from the first signal. The pattern matching device performs a first pattern matching on the basis of the first signal and a second pattern matching on the basis of the second signal. The movement control device performs a first positioning of the object to be worked on the basis of the first pattern matching, then, rotates the object to be worked through 90 degrees, and thereafter, performs a second positioning of the object to be worked on the basis of the second pattern matching.</abstract><edition>5</edition><oa>free_for_read</oa></addata></record>
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subjects	BASIC ELECTRIC ELEMENTS CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS REGULATING SEMICONDUCTOR DEVICES SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES TESTING
title	JPH0619670B
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