container_end_page
container_issue
container_start_page
container_title
container_volume
creator OGISU YASUHIKO
description
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH0612682BB2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH0612682BB2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH0612682BB23</originalsourceid><addsrcrecordid>eNrjZOD2CvAwMDM0MrMwcuJhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFIOpyMjIlSBAB6ixw_</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>JPH0612682B</title><source>esp@cenet</source><creator>OGISU YASUHIKO</creator><creatorcontrib>OGISU YASUHIKO</creatorcontrib><edition>5</edition><language>eng</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; BASIC ELECTRIC ELEMENTS ; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; CORONA DEVICES ; ELECTRICITY ; GENERAL PROCESSES OF COMPOUNDING ; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; OVERVOLTAGE ARRESTERS USING SPARK GAPS ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; SPARK GAPS ; SPARKING PLUGS ; SPRAYING OR ATOMISING IN GENERAL ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; THEIR RELEVANT APPARATUS ; TRANSPORTING ; WORKING-UP</subject><creationdate>1994</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19940216&amp;DB=EPODOC&amp;CC=JP&amp;NR=H0612682B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19940216&amp;DB=EPODOC&amp;CC=JP&amp;NR=H0612682B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OGISU YASUHIKO</creatorcontrib><title>JPH0612682B</title><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>CORONA DEVICES</subject><subject>ELECTRICITY</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>OVERVOLTAGE ARRESTERS USING SPARK GAPS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>SPARK GAPS</subject><subject>SPARKING PLUGS</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>THEIR RELEVANT APPARATUS</subject><subject>TRANSPORTING</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1994</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOD2CvAwMDM0MrMwcuJhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFIOpyMjIlSBAB6ixw_</recordid><startdate>19940216</startdate><enddate>19940216</enddate><creator>OGISU YASUHIKO</creator><scope>EVB</scope></search><sort><creationdate>19940216</creationdate><title>JPH0612682B</title><author>OGISU YASUHIKO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH0612682BB23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1994</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>CORONA DEVICES</topic><topic>ELECTRICITY</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>OVERVOLTAGE ARRESTERS USING SPARK GAPS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>SPARK GAPS</topic><topic>SPARKING PLUGS</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>THEIR RELEVANT APPARATUS</topic><topic>TRANSPORTING</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>OGISU YASUHIKO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OGISU YASUHIKO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>JPH0612682B</title><date>1994-02-16</date><risdate>1994</risdate><edition>5</edition><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JPH0612682BB2
source esp@cenet
subjects AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
BASIC ELECTRIC ELEMENTS
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
CHEMISTRY
COMPOSITIONS BASED THEREON
CORONA DEVICES
ELECTRICITY
GENERAL PROCESSES OF COMPOUNDING
GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
OVERVOLTAGE ARRESTERS USING SPARK GAPS
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
SPARK GAPS
SPARKING PLUGS
SPRAYING OR ATOMISING IN GENERAL
THEIR PREPARATION OR CHEMICAL WORKING-UP
THEIR RELEVANT APPARATUS
TRANSPORTING
WORKING-UP
title JPH0612682B
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T20%3A19%3A35IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=OGISU%20YASUHIKO&rft.date=1994-02-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPH0612682BB2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true