SURFACE TREATING DEVICE

PURPOSE:To evenly and uniformly etch the front and rear faces of a material to be treated by washing the material, then treating the material surface in an etching part provided with a disk which is eccentrically rotated, then performing washing and drying the material. CONSTITUTION:The front and re...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: OKI NOBUAKI, TAKANASHI YASUO, NOHARA SHOZO, HIROYA YOSHINOBU, YOSHITOMI SATOSHI
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:PURPOSE:To evenly and uniformly etch the front and rear faces of a material to be treated by washing the material, then treating the material surface in an etching part provided with a disk which is eccentrically rotated, then performing washing and drying the material. CONSTITUTION:The front and rear faces of a material 90 such as a steel sheet or plate with a resist pattern formed thereon are washed in a first washing part 10, then, the material is introduced into an etching chamber 20 vertically to the horizontal and fixed to a disk 31 placed on an origin roller 33, and the disk 31 is put on an eccentric roller 32 by operating cylinders 34 and 35. Then disk 31 is eccentrically rotated by the eccentric roller 32, an etchant is injected uniformly on both sides of the material 90 on the disk 31, air is then injected by an air knife mechanism 40 to remove the etchant, and etching is stopped. The material 90 is washed in a second washing part 50 and dried in a drying part 60, and the material is evenly and uniformly etched by the etchant.