CHARGED-PARTICLE BEAM LITHOGRAPHIC METHOD

PURPOSE:To realize a block plotting type charged-particle beam lithographic method capable of plotting a required pattern even when block mask is not prepared. CONSTITUTION:A discrimination circuit 11 reads the library number of pattern data, judges whether or not the number is registered to a regis...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	YUASA TETSUO
Format:	Patent
Sprache:	eng
Schlagworte:	ADVERTISING ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICESUSING STATIC MEANS TO PRESENT VARIABLE INFORMATION BASIC ELECTRIC ELEMENTS CALCULATING COMPUTING COUNTING CRYPTOGRAPHY DISPLAY EDUCATION ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL PHYSICS SEALS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PURPOSE:To realize a block plotting type charged-particle beam lithographic method capable of plotting a required pattern even when block mask is not prepared. CONSTITUTION:A discrimination circuit 11 reads the library number of pattern data, judges whether or not the number is registered to a register 13. reads a block number corresponding to the library number when the number is registered, and the data are transmitted over a block selector circuit 14. The block selector circuit 14 generates a deflection signal for deflecting the electron beam to a block to be selected. Consequently, the electron beam EB is deflected to the position of the desired block, and the electron beam passing through the block is projected onto a material 2. A deflection signal based on pattern data is transmitted over a positioning deflector 3 at that time, and the electron beam having a specified sectional shape is projected in the fixed position of the material.