JPH05338698

PURPOSE:To improve the topping process in accuracy which is carried out after the filling by a gas-filling device to avoid inequality in liquid level among different containers. CONSTITUTION:A topping valve 40 is provided to a filling mechanism 8 which is attached to a filler bowl 2 and designed to...

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1. Verfasser: TSUKANO KENICHI
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To improve the topping process in accuracy which is carried out after the filling by a gas-filling device to avoid inequality in liquid level among different containers. CONSTITUTION:A topping valve 40 is provided to a filling mechanism 8 which is attached to a filler bowl 2 and designed to rotate in one piece. The topping valve is designed to be opened by a topping can which is provided at the outside of the channel for the flow in the filling mechanism. When the topping valve is open, a pressurized gas of higher pressure than the pressurized gas 6 inside the filler bowl is blown into a container 10. The topping time varies with changes in the rate of operation of the filling device. When the operation is at a rapid rate, a gas of much higher pressure is blown in because of short topping time, whereas when the operation is at a slow rate, a high-pressure gas of relatively low pressure is blown in because of long topping time.