SEMICONDUCTOR WAFER VAPOR GROWTH DEVICE

PURPOSE:To enable both a semiconductor wafer vapor growth device and especially a reaction oven to be simplified in structure. CONSTITUTION:A semiconductor wafer vapor growth device is equipped with of a susceptor 3 provided inside a vacuum chamber 2 in a rotatable manner, a receiving mechanism 15 a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NUMANAMI MASAE, ISHIDA SADANORI, KOMURA YUKIO
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CRYSTAL GROWTH ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY METALLURGY PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SEMICONDUCTOR DEVICES SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!