PHOTOSENSITIVE COMPOSITION
PURPOSE:To obtain a photosensitive compsn. having high photosensitivity and capable of using light over a wide wavelength range. CONSTITUTION:This photosensitive compsn. is a positive type photosensitive compsn. contg. a compd. having a vinyl ether group obtd. by allowing an active hydrogen-contg. v...
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| creator | AOTANI NORIMASA UMEHARA AKIRA KONDO SHUNICHI |
| description | PURPOSE:To obtain a photosensitive compsn. having high photosensitivity and capable of using light over a wide wavelength range. CONSTITUTION:This photosensitive compsn. is a positive type photosensitive compsn. contg. a compd. having a vinyl ether group obtd. by allowing an active hydrogen-contg. vinyl ether compd. to react with a compd. having an isocyanate group, a compd. which generates an acid when decomposed by irradiation with active rays of light or radiation and an alkali-soluble polymer. |
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CONSTITUTION:This photosensitive compsn. is a positive type photosensitive compsn. contg. a compd. having a vinyl ether group obtd. by allowing an active hydrogen-contg. vinyl ether compd. to react with a compd. having an isocyanate group, a compd. which generates an acid when decomposed by irradiation with active rays of light or radiation and an alkali-soluble polymer.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1993</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930423&DB=EPODOC&CC=JP&NR=H05100428A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930423&DB=EPODOC&CC=JP&NR=H05100428A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>AOTANI NORIMASA</creatorcontrib><creatorcontrib>UMEHARA AKIRA</creatorcontrib><creatorcontrib>KONDO SHUNICHI</creatorcontrib><title>PHOTOSENSITIVE COMPOSITION</title><description>PURPOSE:To obtain a photosensitive compsn. having high photosensitivity and capable of using light over a wide wavelength range. 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CONSTITUTION:This photosensitive compsn. is a positive type photosensitive compsn. contg. a compd. having a vinyl ether group obtd. by allowing an active hydrogen-contg. vinyl ether compd. to react with a compd. having an isocyanate group, a compd. which generates an acid when decomposed by irradiation with active rays of light or radiation and an alkali-soluble polymer.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | PHOTOSENSITIVE COMPOSITION |
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