MANUFACTURE OF SEMICONDUCTOR DEVICE

PURPOSE:To shorten the time required for forming a U-groove by etching by providing processes for selectively removing an oxide film from the bottom of the U-groove, for filling the U-groove with a material containing an impurity of the same conductivity as that of the substrate into which the U-gro...

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Bibliographische Detailangaben
1. Verfasser: HORIKAWA YOSHIHIKO
Format: Patent
Sprache:eng
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