METHOD AND APPARATUS FOR PROCESSING OF SEMICONDUCTOR

PURPOSE:To confirm the progress state of an etching operation in a real-time manner by a method wherein, when the progress situation of the etching operation is monitored at a maskless etching operation using an electron beam, only a prescribed range is irradiated with the electron beam while a reac...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	AKITA KENZO, HIDAKA HIROMI, SUGIMOTO YOSHIMASA, TANETANI MOTOTAKA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS SEMICONDUCTOR DEVICES TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!