PHOTOSENSITIVE RESIN COMPOSITION
PURPOSE:To prevent the dark color development during long-term preservation in a dark place by incorporating a specific arom. carboxylate deriv. into the photopolymerizable photosensitive resin compsn. contg. a leuco compd. as a dye precursor. CONSTITUTION:This compsn. essentially consists of a comp...
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creator | YOKOYAMA KYOKO KASHIO SHIGETORA |
description | PURPOSE:To prevent the dark color development during long-term preservation in a dark place by incorporating a specific arom. carboxylate deriv. into the photopolymerizable photosensitive resin compsn. contg. a leuco compd. as a dye precursor. CONSTITUTION:This compsn. essentially consists of a compd. contg. >=2 pieces of ethylenic unsatd. bonds, a photopolymn. initiator, the leuco compd. as the dye precursor, and the arom. carboxylate deriv. having >=1 pieces of hydroxyl groups adjacent to the arom. group. This arom. carboxylate deriv. includes, for example, alkyl hydroxybenzoate, alkyl sodium oxybenzoate, o-methyl cresotinate, etc. The preferable amt. of this deriv. to be used is 0.01 to 100 pts.wt. of the leuco compd. Since the effect of preventing the dark color development is remarkable in this way, the long-term preservation of the photosensitive resin itself and the plate materials for printing and dry film resists produced by using this compsn. is possible. |
format | Patent |
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CONSTITUTION:This compsn. essentially consists of a compd. contg. >=2 pieces of ethylenic unsatd. bonds, a photopolymn. initiator, the leuco compd. as the dye precursor, and the arom. carboxylate deriv. having >=1 pieces of hydroxyl groups adjacent to the arom. group. This arom. carboxylate deriv. includes, for example, alkyl hydroxybenzoate, alkyl sodium oxybenzoate, o-methyl cresotinate, etc. The preferable amt. of this deriv. to be used is 0.01 to 100 pts.wt. of the leuco compd. Since the effect of preventing the dark color development is remarkable in this way, the long-term preservation of the photosensitive resin itself and the plate materials for printing and dry film resists produced by using this compsn. is possible.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1992</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19921211&DB=EPODOC&CC=JP&NR=H04359255A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19921211&DB=EPODOC&CC=JP&NR=H04359255A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YOKOYAMA KYOKO</creatorcontrib><creatorcontrib>KASHIO SHIGETORA</creatorcontrib><title>PHOTOSENSITIVE RESIN COMPOSITION</title><description>PURPOSE:To prevent the dark color development during long-term preservation in a dark place by incorporating a specific arom. carboxylate deriv. into the photopolymerizable photosensitive resin compsn. contg. a leuco compd. as a dye precursor. CONSTITUTION:This compsn. essentially consists of a compd. contg. >=2 pieces of ethylenic unsatd. bonds, a photopolymn. initiator, the leuco compd. as the dye precursor, and the arom. carboxylate deriv. having >=1 pieces of hydroxyl groups adjacent to the arom. group. This arom. carboxylate deriv. includes, for example, alkyl hydroxybenzoate, alkyl sodium oxybenzoate, o-methyl cresotinate, etc. The preferable amt. of this deriv. to be used is 0.01 to 100 pts.wt. of the leuco compd. Since the effect of preventing the dark color development is remarkable in this way, the long-term preservation of the photosensitive resin itself and the plate materials for printing and dry film resists produced by using this compsn. is possible.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1992</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAI8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJ-PvxMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JJ4rwAPAxNjU0sjU1NHY2LUAAAweiKk</recordid><startdate>19921211</startdate><enddate>19921211</enddate><creator>YOKOYAMA KYOKO</creator><creator>KASHIO SHIGETORA</creator><scope>EVB</scope></search><sort><creationdate>19921211</creationdate><title>PHOTOSENSITIVE RESIN COMPOSITION</title><author>YOKOYAMA KYOKO ; KASHIO SHIGETORA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH04359255A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1992</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>YOKOYAMA KYOKO</creatorcontrib><creatorcontrib>KASHIO SHIGETORA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YOKOYAMA KYOKO</au><au>KASHIO SHIGETORA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE RESIN COMPOSITION</title><date>1992-12-11</date><risdate>1992</risdate><abstract>PURPOSE:To prevent the dark color development during long-term preservation in a dark place by incorporating a specific arom. carboxylate deriv. into the photopolymerizable photosensitive resin compsn. contg. a leuco compd. as a dye precursor. CONSTITUTION:This compsn. essentially consists of a compd. contg. >=2 pieces of ethylenic unsatd. bonds, a photopolymn. initiator, the leuco compd. as the dye precursor, and the arom. carboxylate deriv. having >=1 pieces of hydroxyl groups adjacent to the arom. group. This arom. carboxylate deriv. includes, for example, alkyl hydroxybenzoate, alkyl sodium oxybenzoate, o-methyl cresotinate, etc. The preferable amt. of this deriv. to be used is 0.01 to 100 pts.wt. of the leuco compd. Since the effect of preventing the dark color development is remarkable in this way, the long-term preservation of the photosensitive resin itself and the plate materials for printing and dry film resists produced by using this compsn. is possible.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
title | PHOTOSENSITIVE RESIN COMPOSITION |
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