RESIST COATER
PURPOSE:To provide the title resist coater capable of avoiding the readherence of any splashed resist to a wafer in case it is shaked off by a cup regardless of the viscosity of the resist. CONSTITUTION:A rotary cup 5 is fixed to the rotary axle of a motor 4 leaving the lower half of the conventiona...
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| creator | ISHIBASHI KATSUYUKI |
| description | PURPOSE:To provide the title resist coater capable of avoiding the readherence of any splashed resist to a wafer in case it is shaked off by a cup regardless of the viscosity of the resist. CONSTITUTION:A rotary cup 5 is fixed to the rotary axle of a motor 4 leaving the lower half of the conventional cup of the title coater as it is. Next, a cup cover 6 moving vertically when a wafer is taken in and out is fixed to the peripheral part of the cup 5. In such a constitution, the splash of the resist when it is shaked off can be eliminated by the rotation of the cup 5 thereby enabling the adherence of a solid matter due to the readherence of the resist and the fluctuation in the film thickness to be avoided. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH04352315A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH04352315A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH04352315A3</originalsourceid><addsrcrecordid>eNrjZOANcg32DA5RcPZ3DHEN4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8V4BHgYmxqZGxoamjsbEqAEAs6Qc3A</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>RESIST COATER</title><source>esp@cenet</source><creator>ISHIBASHI KATSUYUKI</creator><creatorcontrib>ISHIBASHI KATSUYUKI</creatorcontrib><description>PURPOSE:To provide the title resist coater capable of avoiding the readherence of any splashed resist to a wafer in case it is shaked off by a cup regardless of the viscosity of the resist. CONSTITUTION:A rotary cup 5 is fixed to the rotary axle of a motor 4 leaving the lower half of the conventional cup of the title coater as it is. Next, a cup cover 6 moving vertically when a wafer is taken in and out is fixed to the peripheral part of the cup 5. In such a constitution, the splash of the resist when it is shaked off can be eliminated by the rotation of the cup 5 thereby enabling the adherence of a solid matter due to the readherence of the resist and the fluctuation in the film thickness to be avoided.</description><language>eng</language><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; APPARATUS SPECIALLY ADAPTED THEREFOR ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>1992</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19921207&DB=EPODOC&CC=JP&NR=H04352315A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19921207&DB=EPODOC&CC=JP&NR=H04352315A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ISHIBASHI KATSUYUKI</creatorcontrib><title>RESIST COATER</title><description>PURPOSE:To provide the title resist coater capable of avoiding the readherence of any splashed resist to a wafer in case it is shaked off by a cup regardless of the viscosity of the resist. CONSTITUTION:A rotary cup 5 is fixed to the rotary axle of a motor 4 leaving the lower half of the conventional cup of the title coater as it is. Next, a cup cover 6 moving vertically when a wafer is taken in and out is fixed to the peripheral part of the cup 5. In such a constitution, the splash of the resist when it is shaked off can be eliminated by the rotation of the cup 5 thereby enabling the adherence of a solid matter due to the readherence of the resist and the fluctuation in the film thickness to be avoided.</description><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1992</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOANcg32DA5RcPZ3DHEN4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8V4BHgYmxqZGxoamjsbEqAEAs6Qc3A</recordid><startdate>19921207</startdate><enddate>19921207</enddate><creator>ISHIBASHI KATSUYUKI</creator><scope>EVB</scope></search><sort><creationdate>19921207</creationdate><title>RESIST COATER</title><author>ISHIBASHI KATSUYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH04352315A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1992</creationdate><topic>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>ISHIBASHI KATSUYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ISHIBASHI KATSUYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>RESIST COATER</title><date>1992-12-07</date><risdate>1992</risdate><abstract>PURPOSE:To provide the title resist coater capable of avoiding the readherence of any splashed resist to a wafer in case it is shaked off by a cup regardless of the viscosity of the resist. CONSTITUTION:A rotary cup 5 is fixed to the rotary axle of a motor 4 leaving the lower half of the conventional cup of the title coater as it is. Next, a cup cover 6 moving vertically when a wafer is taken in and out is fixed to the peripheral part of the cup 5. In such a constitution, the splash of the resist when it is shaked off can be eliminated by the rotation of the cup 5 thereby enabling the adherence of a solid matter due to the readherence of the resist and the fluctuation in the film thickness to be avoided.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | RESIST COATER |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T07%3A52%3A49IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=ISHIBASHI%20KATSUYUKI&rft.date=1992-12-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPH04352315A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |