SEMICONDUCTOR PATTERN FORMING METHOD

PURPOSE:To prevent a contaminated substance from being introduced into a device and enable pattern formation over a wide range to be performed in a short time by placing a semiconductor into oxygen environment, emitting laser interference light so that a specified grating pattern is formed on a surf...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	AKITA KENZO, HIDAKA HIROMI, SUGIMOTO YOSHIMASA, TANETANI MOTOTAKA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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