PRODUCTION OF EPOXIDIZED PARAMETHADIENE (DIPENTENE) ISOMER MIXTURE
PURPOSE:To obtain the title high-purity mixture having excellent hue providing high-quality products as a raw material for electronic materials by epoxidizing a paramethadiene (dipentene) isomer mixture with a peracid to give a crude reaction solution, cleaning the solution with water and separating...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | FUJIWA TAKAAKI |
| description | PURPOSE:To obtain the title high-purity mixture having excellent hue providing high-quality products as a raw material for electronic materials by epoxidizing a paramethadiene (dipentene) isomer mixture with a peracid to give a crude reaction solution, cleaning the solution with water and separating the reaction product. CONSTITUTION:First, paramethadiene (dipentene) isomer mixture is epoxidized with a peracid (e.g. performic acid or peracetic acid). Then the crude reaction solution is cleaned with water and an alkali aqueous solution and the epoxidized product is separated from the crude reaction solution usually by distillation. For example, NaOH, KOH or NaHCO3 is used as the alkali. The amount of the cleaning solution is preferably 0.5-2 times as much as the crude reaction solution. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH04279574A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH04279574A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH04279574A3</originalsourceid><addsrcrecordid>eNrjZHAKCPJ3CXUO8fT3U_B3U3AN8I_wdPGMcnVRCHAMcvR1DfFwdPF09XNV0HDxDHD1CwEyNRU8g_19XYMUfD0jQkKDXHkYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSbxXgIeBiZG5pam5iaMxMWoAH5orqg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PRODUCTION OF EPOXIDIZED PARAMETHADIENE (DIPENTENE) ISOMER MIXTURE</title><source>esp@cenet</source><creator>FUJIWA TAKAAKI</creator><creatorcontrib>FUJIWA TAKAAKI</creatorcontrib><description>PURPOSE:To obtain the title high-purity mixture having excellent hue providing high-quality products as a raw material for electronic materials by epoxidizing a paramethadiene (dipentene) isomer mixture with a peracid to give a crude reaction solution, cleaning the solution with water and separating the reaction product. CONSTITUTION:First, paramethadiene (dipentene) isomer mixture is epoxidized with a peracid (e.g. performic acid or peracetic acid). Then the crude reaction solution is cleaned with water and an alkali aqueous solution and the epoxidized product is separated from the crude reaction solution usually by distillation. For example, NaOH, KOH or NaHCO3 is used as the alkali. The amount of the cleaning solution is preferably 0.5-2 times as much as the crude reaction solution.</description><language>eng</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; GENERAL METHODS OF ORGANIC CHEMISTRY ; HETEROCYCLIC COMPOUNDS ; METALLURGY ; ORGANIC CHEMISTRY</subject><creationdate>1992</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19921005&DB=EPODOC&CC=JP&NR=H04279574A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19921005&DB=EPODOC&CC=JP&NR=H04279574A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FUJIWA TAKAAKI</creatorcontrib><title>PRODUCTION OF EPOXIDIZED PARAMETHADIENE (DIPENTENE) ISOMER MIXTURE</title><description>PURPOSE:To obtain the title high-purity mixture having excellent hue providing high-quality products as a raw material for electronic materials by epoxidizing a paramethadiene (dipentene) isomer mixture with a peracid to give a crude reaction solution, cleaning the solution with water and separating the reaction product. CONSTITUTION:First, paramethadiene (dipentene) isomer mixture is epoxidized with a peracid (e.g. performic acid or peracetic acid). Then the crude reaction solution is cleaned with water and an alkali aqueous solution and the epoxidized product is separated from the crude reaction solution usually by distillation. For example, NaOH, KOH or NaHCO3 is used as the alkali. The amount of the cleaning solution is preferably 0.5-2 times as much as the crude reaction solution.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>GENERAL METHODS OF ORGANIC CHEMISTRY</subject><subject>HETEROCYCLIC COMPOUNDS</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1992</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAKCPJ3CXUO8fT3U_B3U3AN8I_wdPGMcnVRCHAMcvR1DfFwdPF09XNV0HDxDHD1CwEyNRU8g_19XYMUfD0jQkKDXHkYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSbxXgIeBiZG5pam5iaMxMWoAH5orqg</recordid><startdate>19921005</startdate><enddate>19921005</enddate><creator>FUJIWA TAKAAKI</creator><scope>EVB</scope></search><sort><creationdate>19921005</creationdate><title>PRODUCTION OF EPOXIDIZED PARAMETHADIENE (DIPENTENE) ISOMER MIXTURE</title><author>FUJIWA TAKAAKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH04279574A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1992</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>GENERAL METHODS OF ORGANIC CHEMISTRY</topic><topic>HETEROCYCLIC COMPOUNDS</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><toplevel>online_resources</toplevel><creatorcontrib>FUJIWA TAKAAKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FUJIWA TAKAAKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PRODUCTION OF EPOXIDIZED PARAMETHADIENE (DIPENTENE) ISOMER MIXTURE</title><date>1992-10-05</date><risdate>1992</risdate><abstract>PURPOSE:To obtain the title high-purity mixture having excellent hue providing high-quality products as a raw material for electronic materials by epoxidizing a paramethadiene (dipentene) isomer mixture with a peracid to give a crude reaction solution, cleaning the solution with water and separating the reaction product. CONSTITUTION:First, paramethadiene (dipentene) isomer mixture is epoxidized with a peracid (e.g. performic acid or peracetic acid). Then the crude reaction solution is cleaned with water and an alkali aqueous solution and the epoxidized product is separated from the crude reaction solution usually by distillation. For example, NaOH, KOH or NaHCO3 is used as the alkali. The amount of the cleaning solution is preferably 0.5-2 times as much as the crude reaction solution.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JPH04279574A |
| source | esp@cenet |
| subjects | APPARATUS THEREFOR CHEMISTRY GENERAL METHODS OF ORGANIC CHEMISTRY HETEROCYCLIC COMPOUNDS METALLURGY ORGANIC CHEMISTRY |
| title | PRODUCTION OF EPOXIDIZED PARAMETHADIENE (DIPENTENE) ISOMER MIXTURE |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-18T19%3A40%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=FUJIWA%20TAKAAKI&rft.date=1992-10-05&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPH04279574A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |