RADIATION SENSITIVE MIXTURE
PURPOSE: To obtain the radiation sensitive positive composition high in sensitivity by using a phenol resin binder soluble not in water but in an alkali and prepared by substituting phenolic hydroxyl groups with acetal groups. CONSTITUTION: The radiation sensitive composition comprises (a) the binde...
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| creator | ZON GUIEN KIMU |
| description | PURPOSE: To obtain the radiation sensitive positive composition high in sensitivity by using a phenol resin binder soluble not in water but in an alkali and prepared by substituting phenolic hydroxyl groups with acetal groups. CONSTITUTION: The radiation sensitive composition comprises (a) the binder or its mixture soluble not in water but in an alkali, and (b) a compound to be allowed to form a strong acid by irradiation with radiation. The binder (a) is the phenol resin having 20-70% of its hydroxyl groups substituted by a group represented by the formula in which each of R and R is an alkyl group; R is an H atom or an alkyl group; and each of R and R may combine with each other together with -(CH2 )m - to form ring; and (m) is an integer of 3-6. It is preferred for the phenol resin (a) to have an average molecular weight of 300-20000g/mol, especially, 300-2000g/mol. |
| format | Patent |
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CONSTITUTION: The radiation sensitive composition comprises (a) the binder or its mixture soluble not in water but in an alkali, and (b) a compound to be allowed to form a strong acid by irradiation with radiation. The binder (a) is the phenol resin having 20-70% of its hydroxyl groups substituted by a group represented by the formula in which each of R and R is an alkyl group; R is an H atom or an alkyl group; and each of R and R may combine with each other together with -(CH2 )m - to form ring; and (m) is an integer of 3-6. 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CONSTITUTION: The radiation sensitive composition comprises (a) the binder or its mixture soluble not in water but in an alkali, and (b) a compound to be allowed to form a strong acid by irradiation with radiation. The binder (a) is the phenol resin having 20-70% of its hydroxyl groups substituted by a group represented by the formula in which each of R and R is an alkyl group; R is an H atom or an alkyl group; and each of R and R may combine with each other together with -(CH2 )m - to form ring; and (m) is an integer of 3-6. It is preferred for the phenol resin (a) to have an average molecular weight of 300-20000g/mol, especially, 300-2000g/mol.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1992</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAOcnTxdAzx9PdTCHb1C_YM8QxzVfD1jAgJDXLlYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxXgEeBiZGhpbmpuaOxsSoAQByPiEN</recordid><startdate>19920810</startdate><enddate>19920810</enddate><creator>ZON GUIEN KIMU</creator><scope>EVB</scope></search><sort><creationdate>19920810</creationdate><title>RADIATION SENSITIVE MIXTURE</title><author>ZON GUIEN KIMU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH04219757A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1992</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>ZON GUIEN KIMU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ZON GUIEN KIMU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>RADIATION SENSITIVE MIXTURE</title><date>1992-08-10</date><risdate>1992</risdate><abstract>PURPOSE: To obtain the radiation sensitive positive composition high in sensitivity by using a phenol resin binder soluble not in water but in an alkali and prepared by substituting phenolic hydroxyl groups with acetal groups. CONSTITUTION: The radiation sensitive composition comprises (a) the binder or its mixture soluble not in water but in an alkali, and (b) a compound to be allowed to form a strong acid by irradiation with radiation. The binder (a) is the phenol resin having 20-70% of its hydroxyl groups substituted by a group represented by the formula in which each of R and R is an alkyl group; R is an H atom or an alkyl group; and each of R and R may combine with each other together with -(CH2 )m - to form ring; and (m) is an integer of 3-6. It is preferred for the phenol resin (a) to have an average molecular weight of 300-20000g/mol, especially, 300-2000g/mol.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | RADIATION SENSITIVE MIXTURE |
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