MEASUREMENT OF LINE WIDTH

PURPOSE:To precisely measure the actual dimension of exposure pattern line width by a method wherein a vernier pattern provided with a standard dimen sion pattern part and a variable dimension part is previously formed in a photo mask. CONSTITUTION:A vernier pattern 2 is previously formed in a photo...

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1. Verfasser:	OBA FUMIO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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