JPH037210B

PURPOSE:To form a chemical-resistant, wear-resistant surface layer, by activating the surface of a molded plastic optical part with plasma, grafting a vinylsilane compd. onto said surface and oxidizing the surface with oxygen plasma. CONSTITUTION:A plastic optical part 5 is placed within a vacuum tr...

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Hauptverfasser: HATSUTORI SHUZO, OOTSUKA TOSHITSUGU
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Sprache:eng
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creator HATSUTORI SHUZO
OOTSUKA TOSHITSUGU
description PURPOSE:To form a chemical-resistant, wear-resistant surface layer, by activating the surface of a molded plastic optical part with plasma, grafting a vinylsilane compd. onto said surface and oxidizing the surface with oxygen plasma. CONSTITUTION:A plastic optical part 5 is placed within a vacuum treating chamber 1 provided with reticular electrodes 2, 3. An inert gas such as argon is introduced through an inlet 7 thereinto to generate plasma, whereby stains on the surface layer of the optical part 5 are removed and said surface is activated. A vinylsilane compd. 8 such as dichloromethylvinylsilane is introduced and grafted onto the surface layer of the activated high-molecular compd. Oxygen is then introduced through an inlet 7 to generate oxygen plasma which then oxidize side chains composed of the vinylsilane compd. grafted onto the high- molecular compd., thus forming a chemical-resistant, wear-resistant surface layer.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH037210BB2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH037210BB2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH037210BB23</originalsourceid><addsrcrecordid>eNrjZODyCvAwMDY3MjRw4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8QgNTkbGxKgBACwfG4g</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>JPH037210B</title><source>esp@cenet</source><creator>HATSUTORI SHUZO ; OOTSUKA TOSHITSUGU</creator><creatorcontrib>HATSUTORI SHUZO ; OOTSUKA TOSHITSUGU</creatorcontrib><description>PURPOSE:To form a chemical-resistant, wear-resistant surface layer, by activating the surface of a molded plastic optical part with plasma, grafting a vinylsilane compd. onto said surface and oxidizing the surface with oxygen plasma. CONSTITUTION:A plastic optical part 5 is placed within a vacuum treating chamber 1 provided with reticular electrodes 2, 3. An inert gas such as argon is introduced through an inlet 7 thereinto to generate plasma, whereby stains on the surface layer of the optical part 5 are removed and said surface is activated. A vinylsilane compd. 8 such as dichloromethylvinylsilane is introduced and grafted onto the surface layer of the activated high-molecular compd. Oxygen is then introduced through an inlet 7 to generate oxygen plasma which then oxidize side chains composed of the vinylsilane compd. grafted onto the high- molecular compd., thus forming a chemical-resistant, wear-resistant surface layer.</description><language>eng</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; GENERAL PROCESSES OF COMPOUNDING ; INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES ; METALLURGY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORGANIC MACROMOLECULAR COMPOUNDS ; PERFORMING OPERATIONS ; PHYSICS ; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR ; SHAPING OR JOINING OF PLASTICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; TRANSPORTING ; WORKING OF PLASTICS ; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL ; WORKING-UP</subject><creationdate>1991</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19910201&amp;DB=EPODOC&amp;CC=JP&amp;NR=H037210B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19910201&amp;DB=EPODOC&amp;CC=JP&amp;NR=H037210B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HATSUTORI SHUZO</creatorcontrib><creatorcontrib>OOTSUKA TOSHITSUGU</creatorcontrib><title>JPH037210B</title><description>PURPOSE:To form a chemical-resistant, wear-resistant surface layer, by activating the surface of a molded plastic optical part with plasma, grafting a vinylsilane compd. onto said surface and oxidizing the surface with oxygen plasma. CONSTITUTION:A plastic optical part 5 is placed within a vacuum treating chamber 1 provided with reticular electrodes 2, 3. An inert gas such as argon is introduced through an inlet 7 thereinto to generate plasma, whereby stains on the surface layer of the optical part 5 are removed and said surface is activated. A vinylsilane compd. 8 such as dichloromethylvinylsilane is introduced and grafted onto the surface layer of the activated high-molecular compd. Oxygen is then introduced through an inlet 7 to generate oxygen plasma which then oxidize side chains composed of the vinylsilane compd. grafted onto the high- molecular compd., thus forming a chemical-resistant, wear-resistant surface layer.</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES</subject><subject>METALLURGY</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</subject><subject>SHAPING OR JOINING OF PLASTICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>TRANSPORTING</subject><subject>WORKING OF PLASTICS</subject><subject>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1991</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZODyCvAwMDY3MjRw4mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8QgNTkbGxKgBACwfG4g</recordid><startdate>19910201</startdate><enddate>19910201</enddate><creator>HATSUTORI SHUZO</creator><creator>OOTSUKA TOSHITSUGU</creator><scope>EVB</scope></search><sort><creationdate>19910201</creationdate><title>JPH037210B</title><author>HATSUTORI SHUZO ; OOTSUKA TOSHITSUGU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH037210BB23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1991</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES</topic><topic>METALLURGY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</topic><topic>SHAPING OR JOINING OF PLASTICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>TRANSPORTING</topic><topic>WORKING OF PLASTICS</topic><topic>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>HATSUTORI SHUZO</creatorcontrib><creatorcontrib>OOTSUKA TOSHITSUGU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HATSUTORI SHUZO</au><au>OOTSUKA TOSHITSUGU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>JPH037210B</title><date>1991-02-01</date><risdate>1991</risdate><abstract>PURPOSE:To form a chemical-resistant, wear-resistant surface layer, by activating the surface of a molded plastic optical part with plasma, grafting a vinylsilane compd. onto said surface and oxidizing the surface with oxygen plasma. CONSTITUTION:A plastic optical part 5 is placed within a vacuum treating chamber 1 provided with reticular electrodes 2, 3. An inert gas such as argon is introduced through an inlet 7 thereinto to generate plasma, whereby stains on the surface layer of the optical part 5 are removed and said surface is activated. A vinylsilane compd. 8 such as dichloromethylvinylsilane is introduced and grafted onto the surface layer of the activated high-molecular compd. Oxygen is then introduced through an inlet 7 to generate oxygen plasma which then oxidize side chains composed of the vinylsilane compd. grafted onto the high- molecular compd., thus forming a chemical-resistant, wear-resistant surface layer.</abstract><oa>free_for_read</oa></addata></record>
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subjects AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G
AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
CHEMISTRY
COMPOSITIONS BASED THEREON
GENERAL PROCESSES OF COMPOUNDING
INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES
METALLURGY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORGANIC MACROMOLECULAR COMPOUNDS
PERFORMING OPERATIONS
PHYSICS
SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR
SHAPING OR JOINING OF PLASTICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
TRANSPORTING
WORKING OF PLASTICS
WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
WORKING-UP
title JPH037210B
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T15%3A56%3A59IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HATSUTORI%20SHUZO&rft.date=1991-02-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPH037210BB2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true